赵齐,代明江,韦春贝,邱万奇,侯惠君,谭笛.厚钛过渡层缓解铜基上热丝 CVD 金刚石薄膜内应力[J].表面技术,2013,42(5):19-23.
ZHAO Qi,DAI Ming-jiang,WEI Chun-bei,QIU Wan-qi,HOU Hui-jun,TAN Di.Thick Titanium Interlayer Remitting Stress in Diamond Films Deposited on Copper Substrate by Hot Filaments Chemical Vapor Deposition[J].Surface Technology,2013,42(5):19-23 |
| 厚钛过渡层缓解铜基上热丝 CVD 金刚石薄膜内应力 |
| Thick Titanium Interlayer Remitting Stress in Diamond Films Deposited on Copper Substrate by Hot Filaments Chemical Vapor Deposition |
| 投稿时间：2013-05-25 修订日期：2013-06-18 |
| DOI： |
| 中文关键词: 金刚石薄膜 钛过渡层 内应力 热丝化学气相沉积 |
| 英文关键词:diamond films titanium interlayer internal stress hot filaments chemical vapor deposition |
| 基金项目:广东省科技计划项目(2011A081301003) |
| 作者 | 单位 |
| 赵齐 | 广州有色金属研究院, 广州 510651;华南理工大学 材料科学与工程学院, 广州 510640 |
| 代明江 | 广州有色金属研究院, 广州 510651 |
| 韦春贝 | 广州有色金属研究院, 广州 510651 |
| 邱万奇 | 华南理工大学 材料科学与工程学院, 广州 510640 |
| 侯惠君 | 广州有色金属研究院, 广州 510651 |
| 谭笛 | 广州有色金属研究院, 广州 510651 |
|
| Author | Institution |
| ZHAO Qi | Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651 , China;School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640 , China |
| DAI Ming-jiang | Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651 , China |
| WEI Chun-bei | Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651 , China |
| QIU Wan-qi | School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640 , China |
| HOU Hui-jun | Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651 , China |
| TAN Di | Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651 , China |
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| 中文摘要: |
| 以紫铜为基体,在紫铜上先采用磁控溅射技术镀一层金属钛,再以 H2 和 CH4 作为反应气体,采用热丝化学气相沉积法( HFCVD) 在钛过渡层上合成金刚石薄膜,研究不同钛过渡层厚度对金刚石薄膜质量的影响。 利用 X 射线( XRD) 、激光拉曼光谱( Raman) 、扫描电镜( SEM) 分析薄膜的结构、成分和表面形貌,用能谱仪( EDS) 对热处理前后样品的表面进行了元素分析。 研究发现,当钛过渡层厚度为 3 μm 时,生成的金刚石薄膜受到较大内应力而发生破裂;当钛过渡层厚度为 25 μm 时,金刚石薄膜质量较好,薄膜受一定内应力,但没有破裂;850 ℃ 左右保温热处理 12 h,铜原子与钛原子发生了扩散。 |
| 英文摘要: |
| Diamond films were deposited on metal copper substrate with a buffer layer of titanium with the mixture gas of methane and hydrogen by hot filaments chemical vapor deposition ( HFCVD) . Effects of different thickness of titanium layer on diamond films by HFCVD were investigated. The components of films were investigated using X-ray diffraction ( XRD) and laser Raman spectrum, and the surface morphology and structure were observed by scanning electron microscopy ( SEM) . The surface element of samples processed by heat treatment were analyzed using energy disperse spectroscopy ( EDS ) . The results show that when the thickness of titanium layer is 3 μm, the diamond film breaks down due to large internal stress. When the thickness of titanium increases to 25 μm, the diamond film is good and don爷 t break down with the existence of internal stress in the membrane. The diffusion between copper and titanium happens when the sample is processed by heat treating at 850 ℃ for |
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