杜姗,黄美东,刘春伟,唐晓红,吕长东.氧氩流量比对溅射氧化钒薄膜结构和光学性能的影响[J].表面技术,2013,42(4):24-27.
DU Shan,HUANG Mei-dong,LIU Chun-wei,TANG Xiao-hong,LYU Chang-dong.Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films[J].Surface Technology,2013,42(4):24-27 |
| 氧氩流量比对溅射氧化钒薄膜结构和光学性能的影响 |
| Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films |
| 投稿时间：2013-02-18 修订日期：2013-03-07 |
| DOI： |
| 中文关键词: 氧化钒薄膜 氧气流量 氩气流量 反应磁控溅射 |
| 英文关键词:vanadium oxides thin film oxygen flow argon flow reactive magnetron sputtering |
| 基金项目:国家自然科学基金(61078059) ;天津师范大学推进计划项目(52X09038) |
| 作者 | 单位 |
| 杜姗 | 天津师范大学 物理与电子信息学院, 天津 300387 |
| 黄美东 | 天津师范大学 物理与电子信息学院, 天津 300387 |
| 刘春伟 | 天津师范大学 物理与电子信息学院, 天津 300387 |
| 唐晓红 | 天津师范大学 物理与电子信息学院, 天津 300387 |
| 吕长东 | 天津师范大学 物理与电子信息学院, 天津 300387 |
|
| Author | Institution |
| DU Shan | College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 , China |
| HUANG Mei-dong | College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 , China |
| LIU Chun-wei | College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 , China |
| TANG Xiao-hong | College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 , China |
| LYU Chang-dong | College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387 , China |
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| 中文摘要: |
| 采用射频反应磁控溅射方法制备氧化钒( VOx) 薄膜,对样品的沉积速率、物相结构、表面形貌和可见光波段的透过率进行表征,研究了在沉积气压一定的情况下,氧氩流量比对氧化钒薄膜结构和光学性能的影响。 结果表明,改变氧氩流量比可明显改变薄膜结构,随着氧气比例的增加,沉积速率下降,薄膜表面出现了颗粒结构,颗粒尺寸具有增大的趋势,光透过率增大。 |
| 英文摘要: |
| Vanadium dioxides ( VOx) films were fabricated by reactive r. f . magnetron sputtering technique. Deposition rate, phase structure, surface morphology and transmittance in visible range of the films were characterized. Influence of oxygen / argon flow ratio on structure and optical properties of the films was investigated at same deposition air pressure. Results show that the flow ratio can modify the microstructure of the films, as oxygen / argon flow ratio increases, deposition rate of the films decreases while granular size as well as transmittance of the films increases. |
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