祝闻,冉春华,金义栋,聂朝胤,王振林.掺Ti量对类金刚石薄膜机械性能的影响[J].表面技术,2012,(5):7-10.
ZHU Wen,RAN Chun-hua,JIN Yi-dong,NIE Chao-yin,WANG Zhen-lin.The Effect of Ti Content on Mechanical Properties of DLC Films[J].Surface Technology,2012,(5):7-10 |
| 掺Ti量对类金刚石薄膜机械性能的影响 |
| The Effect of Ti Content on Mechanical Properties of DLC Films |
| 投稿时间：2012-06-15 修订日期：2012-10-20 |
| DOI： |
| 中文关键词: 非平衡磁控溅射 掺Ti类金刚石薄膜 结合强度 摩擦磨损性能 |
| 英文关键词:unbalanced magnetron sputtering Ti-DLC cohesion tribological and wear properties |
| 基金项目:重庆市科技攻关项目(CSTC,2008AC4017) |
| 作者 | 单位 |
| 祝闻 | 西南大学材料科学与工程学院,重庆400715 |
| 冉春华 | 西南大学材料科学与工程学院,重庆400715 |
| 金义栋 | 西南大学材料科学与工程学院,重庆400715 |
| 聂朝胤 | 西南大学材料科学与工程学院,重庆400715 |
| 王振林 | 重庆理工大学材料科学与工程学院,重庆400050 |
|
| Author | Institution |
| ZHU Wen | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
| RAN Chun-hua | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
| JIN Yi-dong | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
| NIE Chao-yin | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
| WANG Zhen-lin | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
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| 中文摘要: |
| 采用非平衡磁控溅射技术,通过改变Ti靶溅射电流,在不锈钢衬底表面沉积了不同掺Ti量的类金刚石薄膜(Ti-DLC),研究了掺Ti量对薄膜的显微硬度、弹性模量、膜/基结合强度、断裂韧性及摩擦磨损行为的影响。结果表明:DLC薄膜掺杂Ti后,硬度明显提高,且随着Ti靶溅射电流的增大,薄膜硬度先增加、后降低,Ti靶溅射电流为1.5A 时,薄膜硬度最高;掺杂适量的Ti,可以明显改善DLC薄膜的膜/基结合强度和断裂韧性,并能明显降低DLC薄膜的摩擦系数。 |
| 英文摘要: |
| Using unbalanced magnetron sputtering technique, diamond-like carbon films with different titanium contents(Ti-DLC)were deposited on stainless steel substrates by changing Ti target supttering current. Investigated the influences of Ti content on microhardness, elastic modulus, film-substrate cohesion, fracture toughness, friction and wear behavior of films. Results showed that the hardness of the Ti-DLC films increases obviously compared with the pure DLC films. In the meantime, the hardness of the Ti-DLC films increases first and then decreases with the increase of the Titarget sputtering current and reaches the highest when Ti target sputtering current is increased to 1.5A. Film-substrate cohesion and fracture toughness of the films are improved by depositing some Ti. The friction coefficient of DLC films decreases significantly with the deposition of Ti. |
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