邱家稳,赵栋才.电弧离子镀技术及其在硬质薄膜方面的应用[J].表面技术,2012,(2):93-98.
QIU Jia-wen,ZHAO Dong-cai.A Review of Vacuum Arc Deposition and Its Application in Hardness Films[J].Surface Technology,2012,(2):93-98 |
| 电弧离子镀技术及其在硬质薄膜方面的应用 |
| A Review of Vacuum Arc Deposition and Its Application in Hardness Films |
| 投稿时间：2011-01-26 修订日期：2012-04-20 |
| DOI： |
| 中文关键词: 电弧离子镀 硬质薄膜 氮化物 非晶碳膜 氧化物薄膜 |
| 英文关键词:vacuum arc deposition(VAD) hardness film nitride film a-Cfilm oxide film |
| 基金项目: |
| 作者 | 单位 |
| 邱家稳 | 中国空间技术研究院,北京100094 |
| 赵栋才 | 兰州空间技术物理研究所表面工程技术重点实验室,兰州730000 |
|
| Author | Institution |
| QIU Jia-wen | China Academy of Space Technology, Beijing 100094, China |
| ZHAO Dong-cai | Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
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| 中文摘要: |
| 从电弧蒸发源控制技术和大颗粒过滤技术出发,论述了电弧离子镀技术最近的发展成果,并总结了电弧离子镀技术在氮化物、氧化物、非晶碳等薄膜方面的技术应用进展,以期能对我国电弧离子镀技术及其在硬质薄膜方面的应用起到一定的参考作用。 |
| 英文摘要: |
| The progress of vacuum arc deposition has been discussed from arc mode of operation and the technology of macroparticles filter, and then, the application and progress in hardness films, such as ta-C,CNx,nitride,oxide and advanced films, have been described. The aim of this paper is providing a reference in vacuum arc deposition and its application for researchers in our nation. |
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