杨琼,王传彬,章嵩,张东明,沈强,张联盟.沉积温度和退火处理对BCN薄膜结构的影响[J].表面技术,2010,39(1):63-66.
YANG Qiong,WANG Chuan-bin,ZHANG Song,ZHANG Dong-ming,SHEN Qiang,ZHANG Lian-meng.Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films[J].Surface Technology,2010,39(1):63-66 |
| 沉积温度和退火处理对BCN薄膜结构的影响 |
| Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films |
| 投稿时间：2009-09-18 修订日期：2010-02-10 |
| DOI： |
| 中文关键词: BCN薄膜 沉积温度 退火 脉冲激光沉积 |
| 英文关键词:BCN thin films Deposition temperature Annealing Pulsed laser deposition |
| 基金项目:国家自然科学基金资助项目(50772082) |
| 作者 | 单位 |
| 杨琼 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
| 王传彬 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
| 章嵩 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
| 张东明 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
| 沈强 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
| 张联盟 | 武汉理工大学材料复合新技术国家重点实验室,武汉430070 |
|
| Author | Institution |
| YANG Qiong | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
| WANG Chuan-bin | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
| ZHANG Song | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
| ZHANG Dong-ming | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
| SHEN Qiang | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
| ZHANG Lian-meng | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 采用脉冲激光沉积技术,在Si(100)基片上制备了BCN薄膜,研究了沉积温度和退火处理对BCN薄膜组分和结构的影响。利用傅里叶变换红外光谱(FTIR)和X射线光电子能谱(XPS)对制备的BCN薄膜进行了表征。结果表明:沉积温度升高时,BCN薄膜的组分无明显改变。所制备的BCN薄膜包含B— N,C— B和C— N化学键,是由杂化的B— C— N键构成的化合物。真空退火温度为700℃时,BCN薄膜结构稳定;大气退火温度达到600℃时,BCN薄膜表面发生氧化分解,同时有C≡ N键形成,表明C≡ N键具有较好的高温热稳定性。 |
| 英文摘要: |
| BCN thin films were deposited on Si(100)substrates by pulsed laser deposition. The effects of deposition temperature and annealing on the film composition and structure were investigated.Fourier-transform infrared(FT-IR)spectroscopy and X-ray photoelectron spectroscopy(XPS)were used to characterize the BCN thin films. The results show that deposition temperatures have little influence on film composition. FTIR and XPS analyses indicated the as-deposited BCN films contained B— C, N— C and B— N chemical bonds with B— C— N atomic hybridization.BCN thin films which annealed in vacuum at 700℃ were stable.When annealed in air, the samples were oxidated. Meanwhile, the formation of C≡ N bond indicated that it has better thermal stability. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号