崔新强,李海兵,李国卿,蒋宝财.Ti离子注入对石英玻璃表面金属化的影响[J].表面技术,2010,39(1):48-50,55.
CUI Xin-qiang,LI Hai-bing,LI Guo-qing,JIANG Bao-cai.Influence of Ti Ions Implantation on Quartz Metalization[J].Surface Technology,2010,39(1):48-50,55 |
| Ti离子注入对石英玻璃表面金属化的影响 |
| Influence of Ti Ions Implantation on Quartz Metalization |
| 投稿时间：2009-12-21 修订日期：2010-02-10 |
| DOI： |
| 中文关键词: Ti离子 离子注入 镀Ti膜石英玻璃 结合强度 |
| 英文关键词:Ti ions implantation Quartz coated with Ti film Interfacial adhesion and bond strength |
| 基金项目: |
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| Author | Institution |
| CUI Xin-qiang | Shanghai Institue of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China |
| LI Hai-bing | Shanghai Institue of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China |
| LI Guo-qing | Key Laboratory of Material Modification by Laser, Ion and Electron Beams,Dalian University of Technology, Dalian 116024, China |
| JIANG Bao-cai | Shanghai Institue of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China |
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| 中文摘要: |
| 为提高石英玻璃表面金属化膜层与基底的结合强度,利用金属蒸发真空弧(MEVVA)离子源引出的Ti离子对石英玻璃及镀Ti膜石英玻璃进行离子注入,剂量选择3× 1016,5× 1016 ion/cm2,模拟分析了注入离子能量的分布,采用卢瑟福背散射分析了注入Ti离子在基体中的深度分布,利用划痕实验机对比了镀Ti膜石英玻璃经Ti离子注入前后的膜基结合强度。实验结果表明:石英玻璃经Ti离子(5× 1016 ion/cm2)注入后,钛在基体中呈高斯分布,最大浓度分布在15～ 35 nm范围内;镀Ti膜石英玻璃经Ti离子(5× 1016 ion/cm2)注入后,最大浓度分布在5～ 15 nm范围内,注入离子穿透薄膜进入基材内部。Ti离子注入剂量为5× 1016 ion/cm2时,膜基的结合强度比未注入样品提高了90%。 |
| 英文摘要: |
| Titanium ions were implanted into quartz and quartz coated with Ti film by MEVVA(Metal Vapor Vacuum Arc)ion source implanter.The dose was 3× 1016 ions/cm2 and 5× 1016 ions/cm2.The ion energy and depth distribution were analyzed using simulation method. Depth profiles of Ti concentration were measured by RutIlerf-0rd Back-scattering Spectrometry(RBS).The interfacial adhesion and bond strength between thin film coating and substrate were tested by scratch method. The result shows thatimplanted with Ti the largest component of Ti is about 30 nm for quartz and 15nm for quartz coated with Ti film.Implantation ions penetrated into the substrate through the film. The interfacial adhesion and bond strength between thin film coating and substrate have an increase of 90% after Ti ions implantation with the dose of 5× 1016 ions/cm2 |
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