朱春燕,朱昌.磁控反应溅射AIN薄膜光学性能研究[J].表面技术,2008,37(1):17-18,31.
ZHU Chun-yan,ZHU Chang.The Optical Properties of AIN film by Magnetron Reactive Sputtering[J].Surface Technology,2008,37(1):17-18,31 |
| 磁控反应溅射AIN薄膜光学性能研究 |
| The Optical Properties of AIN film by Magnetron Reactive Sputtering |
| 投稿时间：2007-09-10 修订日期：2008-02-10 |
| DOI： |
| 中文关键词: 氮化铝薄膜 折射率 透过率 红外光谱 磁控反应溅射法 |
| 英文关键词:AIN film Refractive index Transmission FTIR spectrum Magnetron reactive sputtering |
| 基金项目:西安工业大学校长基金项目( XGYXU0506) |
| 作者 | 单位 |
| 朱春燕 | 西安工业大学光电工程学院，陕西西安710032 |
| 朱昌 | 西安工业大学光电工程学院，陕西西安710032 |
|
| Author | Institution |
| ZHU Chun-yan | School of Optoelectronic Engineering, Xian Technological University, Xian 710032, China |
| ZHU Chang | School of Optoelectronic Engineering, Xian Technological University, Xian 710032, China |
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| 中文摘要: |
| 为了制备光学性能良好的AIN薄膜。采用磁控反应溅射法制备了氮化铝(AIN)薄膜，利用椭圆仪、分光光度计、傅立叶变换光谱仪对AIN薄膜进行了相关光学性能的分析。结果表明：在波长为400 - llOOnm时，AIN薄膜的折射率为2.0 -2.4，透过率都在88%以上；在200 - 300nm远紫外光范围内，薄膜具有强烈的吸收；在红外吸收光谱中，677cm。1处存在1个强烈的吸收峰，说明薄膜中已经形成了AIN。 |
| 英文摘要: |
| Aluminum nitride( AIN) thin film using magnetron reactive sputtering were studied by spectroscopic ellipsometry, ultraviolet-visible spectrometry and FTIR spectrometry. The refractive index of the film is 2. 0-2. 4 in the wavelength range from 400nm to llOOnm. The AIN film has an intense absorption in the far ultraviolet ray range of 200nm-300nm, and high transmission in the wavelength range of 400nm-760nm. An intense absorption exists at 677 cm-l of wavelength in the FTIR spectrum, it is shown that the film comes into being aluminum nitride. |
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