| XU Jun-qi,GUO Fang,SU Jun-hong,ZOU Feng.Design and preparation of thin films for laser system[J].Surface Technology,,(): |
| Design and preparation of thin films for laser system |
| 投稿时间：2013-12-04 |
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| DOI： |
| KeyWord:film laser-induced damage threshold (LIDT) optimization annealing |
| Author | Institution |
| XU Jun-qi |
Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, , China |
| GUO Fang |
Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, , China |
| SU Jun-hong |
Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, , China |
| ZOU Feng |
Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, , China |
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| Abstract: |
| Objective To study the laser film stacks and the methods for improving the film’s laser-induced damage threshold. Methods Based on the optimization distribution of electric field intensity, film stacks with high anti-reflection in the band of 3-5μm and cut-off in the wavelength of 1064nm on silicon substrates were designed. All these films were deposited by thermal evaporation techniques, and then the as-deposited thin films were undertaken a treatment process by laser irradiation and vacuum annealing, respectively. Results The results indicated that the various distribution of electric field intensity causes different laser damage properties of thin films. The laser-induced damage threshold (LIDT) can be improved by designing suitable film stacks to lowering the electric field intensity in the interface between layers, or putting the electric field peak in layers with high laser damage ability. The LIDT can also be improved by laser irradiation and vacuum annealing. Conclusion The final laser-induce threshold is improved from 3J/cm2 to 6.2J/cm2 by the process of optimization design, laser irradiation and vacuum annealing. |
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