田灿鑫,周小东,周思华,杨兵,付德君.电弧离子镀制备 TiSiN 纳米复合涂层[J].表面技术,2015,44(8):15-19,37.
TIAN Can-xin,ZHOU Xiao-dong,ZHOU Si-hua,YANG Bing,FU De-jun.Deposition of TiSiN Nanocomposite Coatings by Arc Ion-plating[J].Surface Technology,2015,44(8):15-19,37 |
| 电弧离子镀制备 TiSiN 纳米复合涂层 |
| Deposition of TiSiN Nanocomposite Coatings by Arc Ion-plating |
| 投稿时间：2015-05-07 修订日期：2015-08-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2015.08.003 |
| 中文关键词: 电弧离子镀 TiSiN 纳米复合涂层 SiH4 流量 力学性能 硬度 摩擦系数 |
| 英文关键词:arc ion-plating TiSiN nanocomposite coatings SiH4 flow rate mechanical performance microhardness friction coefficient |
| 基金项目:国家自然科学基金资助项目(11405117, 11405280);河南省教育厅科学技术研究重点项目(14B140021);周口师范学院博士科研启动经费资助项目(zksybscx201210) |
|
|
| Author | Institution |
| TIAN Can-xin | School of Physics and Electromechnical Engineering, Zhoukou Normal University, Zhoukou 466001, China |
| ZHOU Xiao-dong | School of Physics and Technology, Wuhan University, Wuhan 430072, China |
| ZHOU Si-hua | School of Physics and Technology, Wuhan University, Wuhan 430072, China |
| YANG Bing | School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, China |
| FU De-jun | School of Physics and Electromechnical Engineering, Zhoukou Normal University, Zhoukou 466001, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 目的 在 SiH4 气氛下制备 Si 掺杂的 TiSiN 纳米复合涂层,为 SiH4 用于工业化 TiSiN 涂层生产提供依据。 方法 采用电弧离子镀技术,在 SiH4 气氛下,于单晶硅和硬质合金衬底上制备 Si 掺杂的 TiSiN纳米复合涂层,研究 SiH4 流量对 TiSiN 涂层化学组分、微观结构、硬度和耐磨性能的影响。 结果 SiH4 流量对 TiSiN 纳米复合涂层的微观结构、硬度及摩擦系数的影响明显。 随着 SiH4 流量的增加,TiSiN 涂层由柱状晶生长的晶体结构逐渐转变为纳米晶镶嵌于非晶基体的复合结构。 Si 在涂层中以 Si3N4 非晶相存在,随着涂层中 Si 含量逐渐增加,TiN 晶粒尺寸逐渐减小,Si3N4 起到细化晶粒的作用。 在 42 mL/ min 的SiH4 流量下,涂层硬度高达 4100HV0. 025。 在对磨材料为硬质合金的条件下,TiSiN 涂层摩擦系数小于0. 6。 结论 SiH4 气氛下可以制备出 TiN 纳米晶镶嵌于 Si3N4 非晶相结构的 TiSiN 纳米复合涂层,涂层的显微硬度较高。 SiH4 可以作为 Si 源用于 TiSiN 纳米复合涂层的工业化生产。 |
| 英文摘要: |
| Objective To fabricate Si-doped TiSiN nanocomposite coatings in SiH4 ambient, and to provide approaches to fabricate TiSiN nanocomposite coatings using SiH4 in industrial production process. Methods TiSiN coatings were deposited on Si and cemented carbide substrates by cathodic arc ion plating in SiH4 ambient. The effects of SiH4 flow rate on the chemical composition, microstructure, mechanical and tribological properties of the TiSiN nanocomposite coatings were systemically investigated. Results The SiH4 flow rate had an obvious effect on the chemical composition, microstructure, mechanical and tribological properties of the TiSiN nanocomposite coating. With the increase of SiH4 flow rate, the structure of fabricated TiSiN coatings changed from columnar grain to composite structure of nanocrystalline embedded in amorphous phase matrix. The Si added in the coatings was in the amorphous Si3 N4 phase, with the Si content increased, the grain size of TiN decreased, which had a grain refining effect. The microhardness reached up to 4100HV0. 025 at the SiH4 flow rate of 42 mL / min (6. 3 at. % Si in the coating). Friction coefficients of TiSiN nanocomposite coatings increased with the increasing SiH4 flow rate when tested against carbide balls, and the friction coefficient was less than 0. 6. Conclusion The TiSiN nanocomposite coating of nanocrystalline embedded in amorphous matrix could be fabricated in SiH4 ambient. The microhardness was relatively high. SiH4 could be used for the deposition of TiSiN nanocomposite coatings in commercial process. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号