徐均琪,郭芳,苏俊宏,邹逢.激光薄膜的设计与制备[J].表面技术,,():.
XU Jun-qi,GUO Fang,SU Jun-hong,ZOU Feng.Design and preparation of thin films for laser system[J].Surface Technology,,(): |
| 激光薄膜的设计与制备 |
| Design and preparation of thin films for laser system |
| 投稿时间：2013-12-04 |
| DOI： |
| 中文关键词: 薄膜 激光损伤阈值 优化 退火 |
| 英文关键词:film laser-induced damage threshold (LIDT) optimization annealing |
| 基金项目:国家国际科技合作专项资助(2013DFR70620)；国家自然科学基金资助项目（61378050） |
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| Author | Institution |
| XU Jun-qi | Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, 710032, China |
| GUO Fang | Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, 710032, China |
| SU Jun-hong | Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, 710032, China |
| ZOU Feng | Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi’an Technological University, Xian, 710032, China |
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| 中文摘要: |
| 目的 研究激光薄膜的膜系结构及提高激光损伤阈值的制备工艺。方法 基于场强优化分布，设计了Si基底上3-5μm增透、1064nm截止的激光薄膜，并对镀后的薄膜进行了激光辐照处理和真空退火处理。结果 研究结果表明，薄膜内部不同的场强分布，会对其激光损伤特性产生不同的影响。在满足光学性能的情况下，采用适当的膜系结构，使膜层-膜层界面处的电场强度降低，或者使最大电场强度存在于激光损伤阈值较高的材料中，可有效提高整个膜系的激光损伤阈值。采用激光辐照处理和真空退火处理，可以提高薄膜的激光损伤阈值。结论 经过优化设计、激光辐照和真空退火处理，最终使薄膜的激光损伤阈值从3J/cm2提高到6.2J/cm2。 |
| 英文摘要: |
| Objective To study the laser film stacks and the methods for improving the film’s laser-induced damage threshold. Methods Based on the optimization distribution of electric field intensity, film stacks with high anti-reflection in the band of 3-5μm and cut-off in the wavelength of 1064nm on silicon substrates were designed. All these films were deposited by thermal evaporation techniques, and then the as-deposited thin films were undertaken a treatment process by laser irradiation and vacuum annealing, respectively. Results The results indicated that the various distribution of electric field intensity causes different laser damage properties of thin films. The laser-induced damage threshold (LIDT) can be improved by designing suitable film stacks to lowering the electric field intensity in the interface between layers, or putting the electric field peak in layers with high laser damage ability. The LIDT can also be improved by laser irradiation and vacuum annealing. Conclusion The final laser-induce threshold is improved from 3J/cm2 to 6.2J/cm2 by the process of optimization design, laser irradiation and vacuum annealing. |
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