王栋,蔡长龙,弥谦,王麟博,刘桦辰,侯杰.圆筒式磁控溅射靶的磁场仿真与结构设计[J].表面技术,2023,52(8):371-379.
WANG Dong,CAI Chang-long,MI Qian,WANG Lin-bo,LIU Hua-chen,HOU Jie.Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target[J].Surface Technology,2023,52(8):371-379 |
| 圆筒式磁控溅射靶的磁场仿真与结构设计 |
| Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target |
| 投稿时间：2022-06-24 修订日期：2022-09-14 |
| DOI：10.16490/j.cnki.issn.1001-3660.2023.08.032 |
| 中文关键词: 磁控溅射靶 磁场仿真 有限元分析 优化 结构设计 圆筒式 |
| 英文关键词:magnetron sputtering target magnetic field simulation finite element analysis optimization structural design cylindrical type |
| 基金项目:国家自然科学基金(11975177);西安市智能探视感知重点实验室资助项目(201805061ZD12CG45);西安市智能兵器重点实验室资助项目(2019220514SYS020CG042) |
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| Author | Institution |
| WANG Dong | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
| CAI Chang-long | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
| MI Qian | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
| WANG Lin-bo | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
| LIU Hua-chen | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
| HOU Jie | College of Ordnance Science and Technology, Xi'an Technological University, Xi'an 710021, China |
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| 中文摘要: |
| 目的 探究一种可用于实现圆柱形工件外表面镀膜设备的可能性，设计了一种新型的圆筒式磁控溅射靶结构，溅射在圆筒状靶材内表面发生，从整个圆周方向对工件外表面镀膜，以改善传统长管工件镀膜设备体积庞大、结构复杂的不足。方法 首先对圆筒式磁控溅射靶进行初始结构设计，再运用有限元分析软件COMSOL中静磁无电流仿真模块，通过控制变量法对溅射靶内部冷却背板厚度d1、内磁环轴向高度h1、内磁环径向宽度Δr1、外磁环轴向高度h2、外磁环径向宽度Δr2以及内外磁环间距d2不同结构参数下的靶面水平磁感应强度值进行仿真与研究。在此基础上进行磁场优化并设计出溅射靶的理想磁铁结构参数。结果 计算结果表明，当冷却背板厚度为13 mm，外磁环内径为266 mm、外径为310 mm、厚度为20 mm，内磁环内径为270 mm、外径为310 mm、厚度为22 mm，内外磁环间距为50 mm时，距靶面上方3 mm处最大水平磁感应强度为40 mT，磁场分布均匀区域可达40%左右。结论 此外考虑溅射靶内部的水冷、密封以及绝缘结构，最终设计的圆筒式磁控溅射靶整体高384 mm，最大直径432 mm，结构紧凑可靠，为长管工件外表面金属薄膜的制备提出了一种新的磁控溅射靶结构。 |
| 英文摘要: |
| In order to explore the possibility of a device which can be used to coat the outer surface of cylindrical workpiece, a new type of cylindrical magnetron sputtering target is designed. Sputtering takes place on the inner surface of the cylindrical target, and the outer surface of the workpiece is coated from all sides to improve the large volume and complex structure of the traditional coating device for long tube workpiece. Firstly, the initial structure of the cylindrical magnetron sputtering target was designed, and then the magnetostatic non-current simulation module in the finite element analysis software |
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