颜晓强,王晗,张嘉荣,姚洪辉,朱相优,邓建南,卓少木,何景帆.小口径非球面小球头接触式抛光及磁流变抛光组合加工[J].表面技术,2022,51(7):274-287, 323.
YAN Xiao-qiang,WANG Han,ZHANG Jia-rong,YAO Hong-hui,ZHU Xiang-you,DENG Jian-nan,ZHUO Shao-mu,HE Jing-fan.#$NPCombined Process of Small Ball-end Contact Polishing and Magnetorheological Polishing for Small Aperture Aspheric surface[J].Surface Technology,2022,51(7):274-287, 323
小口径非球面小球头接触式抛光及磁流变抛光组合加工
#$NPCombined Process of Small Ball-end Contact Polishing and Magnetorheological Polishing for Small Aperture Aspheric surface
  
DOI:10.16490/j.cnki.issn.1001-3660.2022.07.027
中文关键词:  小口径非球面  磁流变抛光  小球头  组合加工  表面粗糙度  面形精度
英文关键词:small aperture aspheric surface  magnetorheological polishing  small ball-end  combined processing  surface roughness  form accuracy
基金项目:广东省季华实验室项目(X190071UZ190);广东省自然科学基金(2021A1515011817,2021A1515011908)
作者单位
颜晓强 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
王晗 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
张嘉荣 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
姚洪辉 广东省微纳加工技术与装备重点实验室,广州 510006 
朱相优 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
邓建南 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
卓少木 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
何景帆 广东工业大学 省部共建精密电子制造技术与装备国家重点实验室 ;广东省微纳加工技术与装备重点实验室,广州 510006 
AuthorInstitution
YAN Xiao-qiang State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
WANG Han State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
ZHANG Jia-rong State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
YAO Hong-hui Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
ZHU Xiang-you State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
DENG Jian-nan State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
ZHUO Shao-mu State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
HE Jing-fan State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment Jointly Established by the Ministry and the Province Guangzhou 510006, China;Key Laboratory of Micro-Nano Manufacturing Technology and Equipment of Guangdong Province, Guangdong University of Technology, Guangzhou 510006, China 
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中文摘要:
      目的 为了提高非球面光学模具的表面质量和加工效率。方法 分析当前非球面超精密抛光方式及其特点,针对小口径非球面光学模具,提出一种小球头接触式抛光及磁流变抛光的组合加工方法,对小球头进行设计,并抛光碳化钨圆片,对比小球头接触式抛光及轴向、径向、水平方向磁极的永磁体球头的磁流变抛光的加工性能。分别对编号为1#、2#、3#等3个相同轮廓形状的碳化钨非球面模具进行单一方式抛光试验和组合加工试验。结果 通过对小球头抛光碳化钨圆片的加工性能进行分析发现,接触式抛光小球头的去除率为926.5 nm/h,表面粗糙度达到4.396 1 nm;轴向、径向、水平方向磁极的永磁体小球头磁流变抛光的去除率分别为391.7、344.3、353.7 nm/h,表面粗糙度分别为1.425 2、1.877 6、1.887 5 nm。对采用组合加工方法抛光碳化钨非球面的有效性进行验证时发现,非球面1#在单一接触式抛光60 min后表面粗糙度从8.786 6 nm降至3.693 2 nm;非球面2#在单一磁流变抛光60 min后表面粗糙度从8.212 1 nm降至1.674 5 nm;非球面3#在组合抛光方法下先进行15 min接触式抛光,再进行15 min磁流变抛光,表面粗糙度从8.597 2 nm降至1.269 4 nm,面形精度由175.2 nm提高到138.4 nm。结论 组合加工方法可以弥补单一抛光方法的缺陷,并能有效地提高工件的面形精度。与单一接触式抛光方法相比,组合加工方法获得的表面质量更好,抛光后表面粗糙度为1.269 4 nm,远小于单一接触式抛光下的3.693 2 nm;与单一磁流变抛光方法相比,组合加工方法更高效,将样件抛光到同等级别粗糙度所需时间从60 min减少至30 min。
英文摘要:
      The work aims to improve the surface quality and processing efficiency of aspheric optical molds. The current ultra-precision polishing methods and characteristics of aspheric surfaces are analyzed, proposed a combined process of small ball-end contact polishing and magnetorheological polishing for small aperture aspheric surface optical molds. The small ball is designed, and the tungsten carbide disc is polished. Compare the ball-end contact polishing and the above three kinds of different direction of the magnetic pole of permanent magnet ball-end of magnetorheological polishing processing performance. Three tungsten carbide aspheric molds with the same surface shape numbered 1#, 2#, and 3# were subjected to a single method polishing test and a combined processing test. The results of these tests are as follows:When analyzing the processing performance of the small ball-end polished tungsten carbide wafer, the removal rate of the contact polishing small ball-end is 926.5 nm/h, and the surface roughness(Ra) reaches 4.396 1 nm, the removal rates of magnetorheological polishing of permanent magnet small-end with axial, radial and horizontal magnetic poles are 391.7 nm/h, 344.3 nm/h, and 353.7 nm/h, and the surface roughness is 1.425 2 nm, 1.877 6 nm, and 1.887 5 nm. When verifying the effectiveness of the combined processing method of the polished aspheric surface, the surface roughness of aspherical surface 1# is decreased from Ra 8.786 6 nm to Ra 3.693 2 nm after single contact polishing for 60 min; the surface roughness of aspherical surface 2# is decreased from Ra 8.212 1 nm to Ra 1.674 5 nm after single magnetorheological polishing for 60 min; under the combined process, aspherical surface 3# was subjected to 15 min contact polishing and then 15 min magnetorheological polishing, the surface roughness was decreased from Ra 8.597 2 nm to Ra 1.269 4 nm, and the form accuracy was improved from PV 175.2 nm to PV 138.4 nm. The results show that the combined process can compensate for the defects of the single polishing method and effectively improve the form accuracy of the workpiece. Compared with the single contact polishing method, the surface quality obtained by the combined process is better, and the Ra after polishing is 1.269 4 nm, which is much smaller than the 3.693 2 nm under single contact polishing; Compared with the magnetorheological polishing method, the combined process is more highly efficient, it can reduce the time required to polish the sample to the same level of roughness from 60 min to 30 min.
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