吕绪明,何荧,江涛,杨凯,党博,张平则.纯铜表面等离子渗钽层的摩擦磨损性能和耐腐蚀性能[J].表面技术,2022,51(4):219-226.
LYU Xu-ming,HE Ying,JIANG Tao,YANG Kai,DANG Bo,ZHANG Ping-ze.Wear and Corrosion Resistance of Surface Plasma Tantalum Modified Layer on Pure Copper[J].Surface Technology,2022,51(4):219-226
纯铜表面等离子渗钽层的摩擦磨损性能和耐腐蚀性能
Wear and Corrosion Resistance of Surface Plasma Tantalum Modified Layer on Pure Copper
投稿时间:2021-10-20  修订日期:2022-02-21
DOI:10.16490/j.cnki.issn.1001-3660.2022.04.022
中文关键词:  纯铜  双层辉光等离子合金化  渗钽层  微观结构  耐磨性能  耐腐蚀性能
英文关键词:pure copper  double glow plasma surface metallurgy  Ta coating  microstructure  wear resistance  corrosion resistance
基金项目:粒子输运与富集技术国防科技重点实验室开放课题研究基金(SYSJJ-22301)
作者单位
吕绪明 核工业理化工程研究院,天津 300180;粒子输运与富集技术国防科技重点实验室,天津 300180 
何荧 核工业理化工程研究院,天津 300180 
江涛 核工业理化工程研究院,天津 300180;粒子输运与富集技术国防科技重点实验室,天津 300180 
杨凯 南京航空航天大学 材料科学与技术学院,南京 210016 
党博 南京航空航天大学 材料科学与技术学院,南京 210016 
张平则 南京航空航天大学 材料科学与技术学院,南京 210016 
AuthorInstitution
LYU Xu-ming Research Institute of Physical and Chemical Engineering of Nuclear Industry, Tianjin 300180, China;Science and Technology on Particle Transport and Separation Key National Defense Laboratory, Tianjin 300180, China 
HE Ying Research Institute of Physical and Chemical Engineering of Nuclear Industry, Tianjin 300180, China 
JIANG Tao Research Institute of Physical and Chemical Engineering of Nuclear Industry, Tianjin 300180, China;Science and Technology on Particle Transport and Separation Key National Defense Laboratory, Tianjin 300180, China 
YANG Kai School of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China 
DANG Bo School of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China 
ZHANG Ping-ze School of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China 
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中文摘要:
      目的 提高纯铜表面等离子渗钽层的耐磨性能和耐腐蚀性能。方法 采用双辉等离子表面合金化技术在纯铜表面制备渗钽层。通过扫描电子显微镜、能谱分析仪和X射线衍射仪分析渗钽层的微观形貌、元素分布和物相结构。利用纳米压入和表面划痕试验测量渗钽层的硬度和与基体的结合强度。通过摩擦磨损和电化学试验评价渗钽层的耐磨性能和耐腐蚀性能。结果 使用双层辉光等离子表面合金化技术可以在纯铜表面制备出组织致密均匀、内部无孔隙的渗钽层,与基体结合良好,膜层厚度约为12 μm且与基体存在3 μm厚的互扩散过渡层。渗层物相主要为α-Ta,与基体的结合力为25.8 N,渗Ta处理后,试样表面纳米硬度从1.5 GPa提高到7.0 GPa。与纯铜基体相比,渗钽层的摩擦因数从1.15降低到0.82,比磨损率由基体的46.97×10−5 mm3/(N.m)降至渗钽层的22.91×10−5 mm3/(N.m),耐磨性得到提高。纯铜基体主要表现出黏着磨损现象,而渗钽层则表现出轻微的磨粒磨损。渗钽试样在3.5% NaCl溶液中的自腐蚀电位和极化电阻均显著提高,自腐蚀电流密度下降,耐腐蚀性能优异,渗钽层对基体起到很好的腐蚀保护作用。结论 通过双层辉光等离子表面合金化技术在纯铜表面制备得到致密均匀的渗钽层,可有效地提高纯铜的耐磨性能和耐腐蚀性能。
英文摘要:
      This paper aims to improve the wear resistance and corrosion resistance of pure copper by plasma Ta coating. The Ta coating was engineered onto the surface of pure copper by double glow plasma surface alloying technology. The microstructure, elements distribution and phase identification of the Ta coating were characterized by scanning electron microscopy (SEM), energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). Subsequently, the nano-hardness and adhesion strength were measured by nano-indentation tester and scratch tester. The tribological property and anticorrosion property of the Ta coating were carried out by using reciprocating friction and wear tester and electrochemical workstation at room temperature, respectively. The results showed that the Ta coating exhibited a compact and homogeneous structure, with the thicknesses of about 12 μm and the matrix 3 μm interdiffusion transition layer, and the main phase of the coating was α-Ta. The interfacial bond strength between the coating and the substrate was excellent, and the critical load for the coating delamination was 25.8 N. The nano-hardness of the Ta coating was improved from 1.5 GPa to 7.0 GPa. As compared with pure copper substrate, the friction coefficient of the Ta coating declines from 1.15 to 0.82, and the specific wear rate decreased from 46.97×10−5 mm3/(N·m) to 22.91×10−5 mm3/(N·m). Pure copper wore very badly, and there were many grooves and ridges paralleled to the sliding direction with some randomly distributed particles. On the other hand, the wear track of Ta coating was smaller and narrower and most area of the wear track was smooth. The wear resistance of the Ta coating was improved significantly due to its high hardness, which limited plastic deformation of the wear surface. The wear mechanism of the substrate was adhesive wear, while wear mechanism of the Ta coating was slight abrasive wear. The self-corrosion potential and polarization resistance of the Ta coating were significantly increased, and the self-corrosion current density was decreased. The Ta coating hindered the diffusion of Cl‒ in solution to pure copper matrix, and weakened the electrochemical corrosion of the material. Meanwhile, the corrosion potential of the Ta coating was higher than that of pure copper matrix, which improved the thermodynamic stability of the material and exhibits better corrosion resistance in 3.5wt.% NaCl solution. It is concluded that the Ta coating can effectively improve the wear resistance and corrosion resistance of pure copper.
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