邵琦,邵蓝樱,吕冰海,赵萍,王金虎,袁巨龙.基于田口法的石英玻璃剪切增稠抛光工艺参数优化[J].表面技术,2021,50(12):85-93.
SHAO Qi,SHAO Lan-ying,LYU Bing-hai,ZHAO Ping,WANG Jin-hu,YUAN Ju-long.Parameter Optimization by Taguchi Method for Shear Thickening Polishing Process of Quartz Glass[J].Surface Technology,2021,50(12):85-93 |
| 基于田口法的石英玻璃剪切增稠抛光工艺参数优化 |
| Parameter Optimization by Taguchi Method for Shear Thickening Polishing Process of Quartz Glass |
| 投稿时间：2021-09-02 修订日期：2021-11-03 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.12.008 |
| 中文关键词: 石英玻璃 剪切增稠抛光 材料去除率 表面粗糙度 田口法 |
| 英文关键词:quartz glass shear thickening polishing material removal rate surface roughness taguchi method |
| 基金项目:国家自然科学基金(51775508，51805484);浙江省自然科学基金(LR17E050002) |
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| Author | Institution |
| SHAO Qi | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
| SHAO Lan-ying | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
| LYU Bing-hai | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
| ZHAO Ping | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
| WANG Jin-hu | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
| YUAN Ju-long | Ultra-precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China |
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| 中文摘要: |
| 目的 研究石英玻璃剪切增稠抛光(STP)过程中，不同抛光参数对材料去除率及表面粗糙度的影响，提高石英玻璃表面质量，并优化工艺参数。方法 基于田口法设计实验，以材料去除率、表面粗糙度为评价指标，分析抛光速度、磨粒浓度和抛光液pH值三个关键参数对石英玻璃STP抛光效果的影响。通过信噪比评估实验结果，采用方差分析(ANOVA)法计算各因素的权重，并得出最优工艺参数组合。结果 抛光液pH值对Sa的影响最大(41.85%)，其次是磨粒浓度(39.06%)和抛光速度(19.09%)。磨粒浓度对材料去除率(MRR)的影响最显著(63.78%)，其次是抛光速度(28.81%)和抛光液pH值(7.41%)。在优选的抛光参数组合(抛光速度100 r/min，磨粒质量分数12%，抛光液pH=8)下，石英玻璃在抛光8 min后，表面粗糙度Sa从(110±10) nm降低到(1.2±0.3) nm，MRR达到165.2 nm/min。结论 在优化工艺参数下进行剪切增稠抛光，可有效去除石英玻璃表面划痕，提高石英玻璃表面质量。剪切增稠抛光可应用于石英玻璃平面及曲面抛光。 |
| 英文摘要: |
| To improve the quartz glass surface quality and optimize the process parameters, the influence of different polishing parameters on the material removal rate (MRR) and surface roughness in the process of quartz glass shear thickening polishing (STP) was studied. Experiments were designed based on the Taguchi method, and the MRR and surface roughness were used as evaluation conditions to analyze the effects of three key parameters, including polishing speed, abrasive concentration, and the slurry pH value on the STP process of quartz glass. The experimental results were evaluated by the signal-to- noise ratio, and the weight of each factor was calculated by the analysis of variance (ANOVA) method, and the optimal process parameter combination was obtained. As a result, the slurry pH value (41.85%) had the greatest impact on Sa, followed by the abrasive concentration (39.06%) and the polishing speed (19.09%). The abrasive concentration (63.78%) had the most significant effect on MRR, followed by polishing speed (28.81%) and the slurry pH value (7.41%). Under the optimal combination of polishing parameters, the polishing speed 100 r/min, the abrasive concentration 12%, the slurry pH value=8, the surface roughness Sa of the quartz glass decreased from (110±10) nm to (1.2±0.3) nm in 8 minutes’ polishing and the MRR reached 165.2 nm/min. Processing under optimized process parameters, STP can effectively remove scratches on the quartz glass surface and improve the surface quality of quartz glass. The STP method can be applied to the polishing of quartz glass plane and curved surface. |
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