陈强,张而耕,周琼,黄彪,梁丹丹,韩生,李耀东.nc-(Ti,Al)(C,N)/a-SiNx纳米复合薄膜的制备及性能研究[J].表面技术,2021,50(10):230-238.
CHEN Qiang,ZHANG Er-geng,ZHOU Qiong,HUANG Biao,LIANG Dan-dan,HAN Sheng,LI Yao-dong.Preparation and Properties of nc-(Ti,Al)(C,N)/a-SiNx Nanocomposite Films[J].Surface Technology,2021,50(10):230-238
nc-(Ti,Al)(C,N)/a-SiNx纳米复合薄膜的制备及性能研究
Preparation and Properties of nc-(Ti,Al)(C,N)/a-SiNx Nanocomposite Films
投稿时间:2021-01-14  修订日期:2021-07-01
DOI:10.16490/j.cnki.issn.1001-3660.2021.10.022
中文关键词:  TiAlN涂层  阴极电弧  辉光放电  掺杂  复合膜  硬度  耐磨性  结合力
英文关键词:TiAlN coating  cathode arc  glow discharge  doping  composite film  hardness  wear resistance  adhesion
基金项目:上海应用技术大学中青年科技人才发展基金(ZQ2020-24);国家自然科学基金(51971148);上海市自然科学基金(20ZR1455700)
作者单位
陈强 上海应用技术大学 上海物理气相沉积PVD超硬涂层及装备工程技术研究中心,上海 201418 
张而耕 上海应用技术大学 上海物理气相沉积PVD超硬涂层及装备工程技术研究中心,上海 201418 
周琼 上海应用技术大学 上海物理气相沉积PVD超硬涂层及装备工程技术研究中心,上海 201418 
黄彪 上海应用技术大学 上海物理气相沉积PVD超硬涂层及装备工程技术研究中心,上海 201418 
梁丹丹 上海应用技术大学 上海物理气相沉积PVD超硬涂层及装备工程技术研究中心,上海 201418 
韩生 上海应用技术大学 化学与环境工程学院,上海 201418 
李耀东 中国兵器工业集团第二O二研究所,陕西 咸阳 712099 
AuthorInstitution
CHEN Qiang Shanghai Engineering Research Center of Physical Vapor Deposition PVD Superhard Coating and Equipment, Shanghai 201418, China 
ZHANG Er-geng Shanghai Engineering Research Center of Physical Vapor Deposition PVD Superhard Coating and Equipment, Shanghai 201418, China 
ZHOU Qiong Shanghai Engineering Research Center of Physical Vapor Deposition PVD Superhard Coating and Equipment, Shanghai 201418, China 
HUANG Biao Shanghai Engineering Research Center of Physical Vapor Deposition PVD Superhard Coating and Equipment, Shanghai 201418, China 
LIANG Dan-dan Shanghai Engineering Research Center of Physical Vapor Deposition PVD Superhard Coating and Equipment, Shanghai 201418, China 
HAN Sheng School of Chemistry and Environmental Engineering, Shanghai Institute of Technology, Shanghai 201418, China 
LI Yao-dong No.202 Research Institute of China Ordnance Industry Corporation, Xianyang 712099, China 
摘要点击次数:
全文下载次数:
中文摘要:
      目的 研究Si、C单元素掺杂及其共同掺杂TiAlN涂层对涂层性能的影响。方法 基于阴极电弧+辉光放电技术,在SUS304不锈钢基体及硬质合金刀具上分别制备nc-(Ti,Al)N、nc-(Ti,Al)N/a-SiNx、nc-TiAlCN及nc-TiAlCN/a-SiNx/a-C纳米复合薄膜,通过SEM观察涂层的微观组织形貌,并借助EDS表征涂层的元素成分,用XRD分析涂层的物相构成,探究C、Si元素对涂层生长的影响。采用纳米硬度仪测试涂层的硬度,采用二维轮廓仪及三维形貌仪表征涂层的表面粗糙度及表面形貌,通过滑动摩擦磨损试验测定涂层的耐磨性,用纳米划痕仪表征涂层的摩擦系数及涂层与基体的结合强度,用铣削实验表征涂层的切削性能。结果 该技术制备的TiAlN涂层,内部晶相结构复杂,硬度为29.57 GPa,主要归因于Ti2AlN、Ti2N等硬质相及TiN0.3相的形成降低了涂层的晶格常数。此为首次报道通过物理气相沉积方法制备含TiN0.3相的涂层。TiAlSiN涂层的硬度最高,为37.69 GPa,且耐磨性最好,主要原因是Si的添加起到了细晶强化和晶界强化的作用。C掺杂TiAlN使涂层析出更多非晶相,涂层硬度降低。C、Si元素共同掺杂,使得nc-TiAlCN/a-SiNx/a-C涂层表现出较低的摩擦系数及表面粗糙度,但与基体的结合性能最差,nc-(Ti,Al)N/a-SiNx薄膜的结合强度最好。结论 涂层均提高了基体表面的显微硬度,Si、C元素的掺杂可使涂层的某些性能得以大幅提升,但在实际应用中,还需根据应用需求选择合适的涂层。
英文摘要:
      To study the effect of Si, C single element doping and Si, C co-doping on the properties of TiAlN coating. nc-(Ti,Al)N, nc-(Ti,Al)N/a-SiNx, nc-TiAlCN and nc-TiAlCN/a-SiNx/a-C nanocomposite films were prepared on SUS304 stainless steel substrate and cemented carbide tools by the cathodic arc and glow discharge technology. The microstructure of the coating was observed by SEM, and the element composition was characterized by EDS. The phase composition was analyzed by XRD to explore the effect of C and Si on the performance of the coating. The coating hardness was measured by nano hardness tester, the surface roughness and morphology were characterized by two-dimensional profilometer and three-dimensional profilometer, the wear resistance was measured by sliding friction and wear test, and the friction coefficient and the bonding strength between the coating and the substrate were measured by nano scratch tester, cutting performance of the coating was characterized by milling experiment. The hardness of TiAlN coating is 29.57 GPa, which is mainly attributed to the formation of Ti2AlN, Ti2N, and other hard phases, and the formation of the TiN0.3 phase reduces the lattice constant of the coating. The coating containing the TiN0.3 phase prepared by physical vapor deposition is reported for the first time. The hardness of TiAlSiN coating is the highest, which is 37.69 GPa, and the wear resistance is the best. The main reason is that the addition of Si plays the role of fine grain strengthening and grain boundary strengthening. C-doped TiAlN can precipitate a more amorphous phase and decrease the hardness of the coating. The addition of C and Si elements makes nc-TiAlCN/a-SiNx/a-C coating show lower friction coefficient and surface roughness, but the bonding performance with the substrate is the worst, and the bonding strength of nc-(Ti,Al)N/a-SiNx coating is the best. The microhardness of the substrate surface is improved by the coating. The doping of Si and C elements can greatly improve some properties of the coating. However, in practical application, the appropriate coating should be selected according to the application requirements.
查看全文  查看/发表评论  下载PDF阅读器
关闭

关于我们 | 联系我们 | 投诉建议 | 隐私保护 | 用户协议

您是第20102369位访问者    渝ICP备15012534号-3

版权所有:《表面技术》编辑部 2014 surface-techj.com, All Rights Reserved

邮编:400039 电话:023-68792193传真:023-68792396 Email: bmjs@surface-techj.com

渝公网安备 50010702501715号