冀彬,王为.Fe基软磁性薄膜的电化学合成研究进展[J].表面技术,2021,50(4):151-158.
JI Bin,WANG Wei.Research Progress in Electrochemical Synthesis of Fe-based Soft Magnetic Films[J].Surface Technology,2021,50(4):151-158 |
| Fe基软磁性薄膜的电化学合成研究进展 |
| Research Progress in Electrochemical Synthesis of Fe-based Soft Magnetic Films |
| 投稿时间：2020-07-29 修订日期：2020-12-23 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.04.014 |
| 中文关键词: Fe基软磁性材料 电沉积 复合电沉积 磁性能 工艺参数 |
| 英文关键词:Fe-based soft magnetic materials electrodeposition composite electrodeposition magnetic properties process parameters |
| 基金项目: |
|
|
|
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| Fe基软磁材料主要有FeNi合金、FeCo合金和FeSi合金等。由于它们具备高磁化强度、高磁化率和低矫顽力等优异的软磁性能，而被广泛应用于电子、电气、国防等领域。随着科技的发展，要求电子元器件具有更小的尺寸和更优异的性能，因而对软磁性材料薄膜化的需求也日益迫切。从电化学基本原理出发，针对当前的研究现状，对电沉积合成Fe基软磁性薄膜材料的各个工艺参数的影响与调控进行了简单的分析与介绍。主要介绍了电沉积方法，并介绍了电沉积法多种调控沉积层成分、形貌、厚度以及性能的手段。随后介绍了Fe基软磁性薄膜的电沉积工艺研究现状，研究表明，沉积电流、镀液组成、镀液pH值、温度、沉积时间、外加磁场等因素均会影响磁性薄膜的组成及性能。此外，单独介绍了FeSi合金电化学制备复合电沉积技术，主要介绍了FeSi合金复合共沉积中硅的分散性问题，并对铁硅合金的电沉积研究现状作了简单总结。主要的目的在于能对当前Fe基软磁性材料的研究现状有一定的掌握，并对以后的发展使用提供借鉴。 |
| 英文摘要: |
| Fe-based soft magnetic materials mainly include FeNi alloy, FeCo alloy and FeSi alloy. Due to their excellent soft magnetic properties such as high magnetization, high magnetic susceptibility and low coercivity, they are widely used in electronics, electrical, national defense fields. With the development of science and technology, electronic components are required to have smaller sizes and better performance, so the demand for thinning the soft magnetic materials is becoming increasingly urgent. From the basic principles of electrochemistry, this paper briefly analyzes and introduces the influence and control of various process parameters of the electrodeposition synthesis of Fe-based soft magnetic film materials based on the current research status. The first part of the paper mainly introduces the electrodeposition method. Electrodeposition refers to the process in which related ions in the solution are electrochemically reduced to metal atoms on the surface of the cathode under the action of an electric field and then enter the metal lattice. The general reaction conditions are normal temperature and pressure. Various methods of controlling the composition, morphology, thickness, and performance of the deposited layer by electrodeposition are introduced. The second part of the paper mainly introduces the current status of the electrodeposition process of Fe-based soft magnetic films. The research shows that the deposition current, the composition of the plating solution, the pH value of the plating solution, temperature, the deposition time, the external magnetic field and other factors will affect the composition and performance of the magnetic film. In addition, because the electrochemical preparation of FeSi alloys belongs to the composite electrodeposition technology, this paper introduces it separately. This part mainly introduces the dispersibility of silicon in FeSi alloy composite codeposition, and briefly summarizes the research status of FeSi alloy electrodeposition. The main purpose of this paper is to have a certain grasp of the current research of Fe-based soft magnetic materials, and to provide reference for future development. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号