高恒蛟,徐友慧,熊玉卿,王艺,王虎,李林,何延春.直流磁控溅射技术在柔性基底上制备光电屏蔽薄膜的研究[J].表面技术,2021,50(3):225-231.
GAO Heng-jiao,XU You-hui,XIONG Yu-qing,WANG Yi,WANG Hu,LI Lin,HE Yan-chun.Study on Preperation of Photoelectric Shielding Film by DC Magnetron Sputtering Technology on Flexible Polyimide Substrate[J].Surface Technology,2021,50(3):225-231 |
| 直流磁控溅射技术在柔性基底上制备光电屏蔽薄膜的研究 |
| Study on Preperation of Photoelectric Shielding Film by DC Magnetron Sputtering Technology on Flexible Polyimide Substrate |
| 投稿时间：2020-03-27 修订日期：2020-05-22 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.03.022 |
| 中文关键词: 直流磁控溅射 聚酰亚胺 太阳吸收率 电磁信号衰减 热控薄膜 |
| 英文关键词:DC magnetron sputtering polyimide solar absorptivity electromagnetic signal attenuation thermal control film |
| 基金项目:国家自然科学基金项目(11705074) |
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| Author | Institution |
| GAO Heng-jiao | Lanzhou Institute of Physics, Lanzhou 730000, China |
| XU You-hui | Lanzhou Institute of Physics, Lanzhou 730000, China |
| XIONG Yu-qing | Lanzhou Institute of Physics, Lanzhou 730000, China |
| WANG Yi | Lanzhou Institute of Physics, Lanzhou 730000, China |
| WANG Hu | Lanzhou Institute of Physics, Lanzhou 730000, China |
| LI Lin | Lanzhou Institute of Physics, Lanzhou 730000, China |
| HE Yan-chun | Lanzhou Institute of Physics, Lanzhou 730000, China |
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| 中文摘要: |
| 目的 研究离子束清洗活化和直流磁控溅射工艺参数对聚酰亚胺-铝薄膜光电性能的影响，确定最佳的制备工艺参数。方法 单一改变离子束活化工艺参数(离子源功率、气体流量和走带速率)和磁控溅射控制参数(真空度、离子能量、离子束流、温度、气体流量、走带速率及走带张力)，研究薄膜吸收率、附着力和薄膜外观变化规律。借助扫描电镜、光学仪器和电磁信号测试设备，对最佳工艺条件下制备的薄膜的形貌、透过率、电磁信号衰减频率进行了测试。结果 在离子源功率为1260 W、气体流量为120 mL/min、走带速率为0.3 m/min，镀膜辊温度为10 ℃，溅射功率为10 000 W的条件下，制备的聚酰亚胺-铝光电屏蔽膜太阳吸收率最小为0.09，膜层附着力强，没有异常放电现象，表面光滑。铝在微观状态下呈现微小颗粒状态，表面致密。在0.4~14 μm波段范围内，薄膜透射率<3.5%;在3~15 GHz频率范围内，薄膜电磁信号衰减率>30 dB。结论 通过直流磁控溅射技术制备的聚酰亚胺-铝光电屏蔽膜具有优异的光学性能和电磁屏蔽性能，在热控薄膜、屏蔽膜等领域具有广泛的应用前景。 |
| 英文摘要: |
| This paper aims to study the effects of the parameters of ion cleaning activation and DC magnetron sputtering on properties of polyimide-aluminum films. The effects of plasma activation process parameters (power of ion source, flow rate of cleaning gas, speed of belt) and magnetron sputtering parameters (power of sputtering, flow rate of sputtering gas, temperature of coating roller, belt speed and stress) on the solar absorptivity, adhesion and appearance of film have been studied to determine the optimal process parameters. The morphology, transmittance and electromagnetic signal attenuation frequency of the film are measured by the scanning electron microscopy, optical instruments and electromagnetic signal testing equipment. The results show that when the ion source power is 1260 W, the gas flow rate is 120 mL/min, the belt speed is 0.3 m/min, the temperature of the coating roller is 10 ℃, and the sputtering power is 10 000 W, the minimum solar absorptivity of the prepared PI-aluminum film is 0.09, the adhesion of the film is strong, the abnormal discharge phenomenon is the least, and the surface is smooth. The film transmittance is less than 3.5% in band range of 0.4~14 μm, the electromagnetic signal attenuation rate of film is more than 30 dB in the 3~15 GHz frequency range. The polyimide-aluminum photoelectric films prepared by DC magnetron sputtering have excellent optical properties and electromagnetic shielding properties, which has a wide range of application prospects in field of thermal control films, shielding films and so on. |
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