安邦,王亚强,张金钰,刘刚,孙军.高熵合金薄膜制备、微观结构与性能的研究进展[J].表面技术,2021,50(2):74-90.
AN Bang,WANG Ya-qiang,ZHANG Jin-yu,LIU Gang,SUN Jun.Research Progress in Preparation, Microstructure and Properties of Thin High-entropy Alloy Films[J].Surface Technology,2021,50(2):74-90 |
| 高熵合金薄膜制备、微观结构与性能的研究进展 |
| Research Progress in Preparation, Microstructure and Properties of Thin High-entropy Alloy Films |
| 投稿时间：2020-04-07 修订日期：2020-06-15 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.02.009 |
| 中文关键词: 高熵合金薄膜 表面技术 溅射沉积 激光熔覆 力学性能 抗辐照性能 |
| 英文关键词:thinhigh-entropy alloy films surface technology sputtering deposition laser cladding mechanical properties irradiation resistance |
| 基金项目:国家自然科学基金项目(51621063，51625103，51790482，51722104) |
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| Author | Institution |
| AN Bang | State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China |
| WANG Ya-qiang | State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China |
| ZHANG Jin-yu | State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China |
| LIU Gang | State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China |
| SUN Jun | State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China |
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| 中文摘要: |
| 相较于传统的薄膜，高熵合金薄膜具有更加优异的力学性能和独特的物理化学性能，在近14年获得了长足发展。概述了近年来有关高熵合金薄膜的研究进展，首先介绍了高熵合金薄膜的制备工艺方法(溅射沉积、等离子喷涂、激光熔覆、等离子转移电弧熔覆、电化学沉积以及阴极电弧沉积等)，详细说明了应用范围最广的溅射沉积技术的分类和特点，并且阐述了各工艺技术的优缺点及应用范围。其次，总结了高熵合金薄膜的微观结构特征和性能(力学性能、耐腐蚀、耐磨损、抗辐照以及耐高温氧化性能等)。高熵合金打破了传统合金通过添加其他合金元素来获得特定性能的设计准则，是一种多主元合金固溶体，因此微观结构更加致密，相结构更加稳定且体系更加复杂，这使得高熵合金薄膜/涂层同样表现出比传统涂层更加优良的综合性能。最后，讨论了目前研究工作的问题和不足之处，主要存在的问题是针对结构和性能之间关系的研究不够透彻，内在机理尚不明确，未来的研究应该着重于此。 |
| 英文摘要: |
| Compared with traditional alloy films, the thin high-entropy alloy (HEA) films exhibit more excellent mechanical properties and unique physicochemical properties, which have made great progress in the past 14 years. In order to review the recent research progress of thin HEA films, this paper first introduces the preparation technology (sputtering deposition, plasma spraying, laser cladding, plasma-transferred arc-cladding, electrochemical deposition and cathodic-arc-vapor deposition) of thin HEA films, elaborates the classification and characteristics of the most widely used sputtering deposition technology, as well as the advantages & disadvantages and application scope of each technology, and then summarizes the microstructures and properties (mechanical properties, corrosion resistance, wear resistance, irradiation resistance and high-temperature oxidation resistance) of thin HEA films. HEA is a kind of multiple principal-element solid solutions, which breaks the conventional design criteria of alloy materials to obtain particular properties via adding other alloying elements. Therefore, for thin HEA films, the microstructure is denser, the phase structure is more stable, and the system is more complex, which make it exhibit many outstanding performances. Finally, this paper discusses the existing problems and shortcomings in the current research, among which the main problem is that the research on the relationship between structure and performance is not thorough enough, the internal mechanism is not yet clear, so the research should focus on this in the future. |
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