姜涛.偏压对AlTiN涂层的物性及车削GH4169性能的影响[J].表面技术,2020,49(12):330-335.
JIANG Tao.Effect of Bias-voltage on Physical Properties and Cutting GH4169 Performance of TiAlN Coatings[J].Surface Technology,2020,49(12):330-335 |
| 偏压对AlTiN涂层的物性及车削GH4169性能的影响 |
| Effect of Bias-voltage on Physical Properties and Cutting GH4169 Performance of TiAlN Coatings |
| 投稿时间：2019-11-20 修订日期：2020-03-09 |
| DOI：10.16490/j.cnki.issn.1001-3660.2020.12.039 |
| 中文关键词: AlTiN涂层 基体偏压 纳米硬度 内应力 月牙洼磨损 高温合金 车削 |
| 英文关键词:AlTiN coatings substrate bias-voltage nano-hardness residual stresses crater wear high-temperature alloy cutting |
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| 中文摘要: |
| 目的 研究不同基体偏压对AlTiN涂层性能的影响，以得到车削高温合金性能最佳的AlTiN涂层。方法 采用多弧离子镀技术，在不同偏压下在WC-Co硬质合金表面沉积AlTiN涂层。通过扫描电子显微镜(SEM)及其所附能谱仪(EDS)观察涂层的表面和截面形貌以及分析涂层的成分，X射线衍射仪分析涂层的物相结构及内应力，用CSM纳米硬度计测试涂层的纳米硬度H、弹性模量E、抗塑形变形因子H3/E*2、显微硬度耗散系数MDP等性能指标。对比不同偏压制备的AlTiN涂层车削高温合金GH4169的切削性能表现，并分析其切削失效形式，同时探究涂层物性对月牙洼磨损失效的影响。结果 不同偏压制备的AlTiN涂层结构致密，物相均为NaCl型面心立方结构，–40 V偏压制备的涂层以(200)方向择优，–120 V制备的涂层以(111)方向择优。不同偏压制备的涂层均为压应力，其内应力随着偏压的增大而增大。与–80 V及–120 V制备的涂层相比，–40 V偏压制备的涂层表现出更低的硬度与更优的韧性。在车削高温合金GH4169时，–80 V偏压制备的涂层抗月牙洼磨损能力最好，–40 V与–120 V的切削性能相当。结论 对AlTiN涂层而言，–80 V偏压制备的涂层硬度与应力之间达到平衡，硬度与应力间的平衡有助于提升涂层的抗月牙洼磨损能力。在车削GH4169时，–80 V偏压制备的AlTiN切削性能表现最优。 |
| 英文摘要: |
| The work aims to study the effect of different substrate bias-voltage on physical properties of TiAlN coatings, to obtain TiAlN coatings of superior cutting high-temperature alloy performance. TiAlN coatings were deposited on WC-Co cemented carbide substrate by multi-arc ion plating technology under different bias-voltage. The microstructure and composition were observed and analyzed by SEM and EDS. The phase structure and the residual stress were analyzed by XRD, and the nano-hardness (H), indentation modulus (E), factor of plastic deformation resistance (H3/E2), microhardness dissipation parameter (MDP) were tested by CSM nano-hardness tester. The cutting performance of AlTiN coatings of cutting high-temperature alloy as prepared was compared. Their failure modes of cutting were analyzed. The effect of coating properties on the crater wear failure was explored TiAlN coatings prepared under different bias-voltage showed a dense structure with NaCl face-centered cubic. The coating prepared under -40 V bias-voltage was (200) preferred orientation, while -120 V was (111) preferred orientation. The compressive residual stress of the coatings was increased with the increase of bias-voltage. The coating deposited under -40 V had lower hardness and larger MDP compared with coatings prepared under -80 V and -120 V. In cutting high temperature alloy GH4169, coating prepared under -80 V had stronger crater wear resistance, and showed equivalent performance to coatings prepared under -40 V and -120 V. For TiAlN coating, the balance of hardness and residual stress of coating prepared under –80 V can get excellent crater wear resistance. In cutting TiAlN, TiAlN deposited under -80 V exhibits more excellent cutting performance. |
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