黄亚博,陈良贤,贾鑫,安康,魏俊俊,刘金龙,李成明.CVD金刚石表面增透膜的研究进展[J].表面技术,2020,49(10):106-117.
HUANG Ya-bo,CHEN Liang-xian,JIA Xin,AN Kang,WEI Jun-jun,LIU Jin-long,LI Cheng-ming.Research Progress of Anti-reflection Films on CVD Diamond Surface[J].Surface Technology,2020,49(10):106-117 |
| CVD金刚石表面增透膜的研究进展 |
| Research Progress of Anti-reflection Films on CVD Diamond Surface |
| 投稿时间：2020-03-27 修订日期：2020-10-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2020.10.012 |
| 中文关键词: CVD金刚石 增透膜 表面改性 掺杂 晶体结构转变 透过率 稀土氧化膜 |
| 英文关键词:CVD diamond anti-reflection film surface modification doped crystal structure transformation transmittance rare earth oxide film |
| 基金项目:国家重点研发计划（2018YFB0406501） |
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| Author | Institution |
| HUANG Ya-bo | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| CHEN Liang-xian | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| JIA Xin | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| AN Kang | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| WEI Jun-jun | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| LIU Jin-long | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| LI Cheng-ming | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
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| 中文摘要: |
| CVD金刚石膜因特有的物理化学性质，具有发展成为新一代光学材料的前景。但由于CVD金刚石膜自身局限性导致其理论透过率不到71%，在金刚石膜表面镀制增透膜，通过改变增透膜组成成分、显微组织和晶体结构，可有效地改善CVD金刚石膜自身理论透过率的问题。首先，介绍了CVD金刚石表面镀制单层增透膜增透原理，并总结了物理和化学气相沉积技术制备增透膜的优缺点。然后，重点综述了近年来CVD金刚石表面氮化物、金属氧化物和稀土金属氧化物等增透膜材料的研究进展，详细分析了增透膜制备参数、热处理工艺、衬底表面改性和掺杂工艺对增透膜整体组织和性能影响的规律。其中优化增透膜沉积温度、氧分压和热处理等工艺参数，是通过改变增透膜微观组织形貌以及晶体结构来提高其光学透过性能，而改变衬底表面结构能够通过改变增透膜与基体之间的成键方式来提升界面结合能力，而稀土元素掺杂方式是通过改变增透膜化学组成成分来改善增透膜的光学透过性能，并指出掺杂元素成型机理和影响机制。最后，展望了未来CVD金刚石表面增透膜的发展方向。 |
| 英文摘要: |
| Due to unique physical and chemical properties, chemical vapor deposition (CVD) diamond films have the prospect of developing into a next generation optical materials. However, the theoretical optical transmittance of CVD diamond is only 71% due to limitations, so anti-reflection film can be deposited on CVD diamond film and the theoretical optical transmittance of CVD diamond can be effectively improved by changing composition, microstructure and crystal structure of the anti-reflection film. Firstly, the principles of single anti-reflection films on the CVD diamond was introduced, and the advantages and disadvantages of preparing anti-reflection films by physical vapor deposition and chemical vapor deposition were summarized. Then, the recent research progress of nitride, metal oxide and rare earth oxide anti-reflective films etc. on CVD diamond surface was reviewed emphatically. The effects of preparation parameters, heat treatment process, surface modification of substrate and doping process on the microstructure and properties of anti-reflection films were analyzed. In terms of the preparation parameters, optimizing the process of deposition temperature, the pressure of oxygen and heat treatment improved the optical transmittance of the whole anti-reflection film by changing microstructure and crystal structure. Changing the surface structure of substrate was mainly to improve the binding ability of interface by changing the bonding ability between anti-reflection film and substrate. The doping process of rare earth was to improve the optical transmittance of anti-reflective films by changing the chemical composition, and the forming mechanism and effect mechanism of the doping element was pointed out. Finally, the future development trend on CVD diamond surface was prospected. |
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