周光波,彭湘桂,陈加辉,刘永永.光电子器件外壳脉冲电镀镍钴合金工艺及其耐蚀性[J].表面技术,2020,49(4):356-363.
ZHOU Guang-bo,PENG Xiang-gui,CHEN Jia-hui,LIU Yong-yong.Pulse Electroplating Nickel-Cobalt Alloy Process for Optoelectronic Device Shell and Its Corrosion Resistance[J].Surface Technology,2020,49(4):356-363 |
| 光电子器件外壳脉冲电镀镍钴合金工艺及其耐蚀性 |
| Pulse Electroplating Nickel-Cobalt Alloy Process for Optoelectronic Device Shell and Its Corrosion Resistance |
| 投稿时间：2019-08-13 修订日期：2020-04-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2020.04.042 |
| 中文关键词: 脉冲电镀 镍钴合金 氨基磺酸镍 电镀工艺 光电子器件外壳 耐腐蚀性 |
| 英文关键词:pulse electroplating Ni-Co alloy nickel sulfamate electroplating process optoelectronics devices shell corrosion resistance |
| 基金项目: |
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| Author | Institution |
| ZHOU Guang-bo | China Electronic Technology Group Chongqing Acousitc-Optic-Electric Co, Ltd, Chongqing 400060, China |
| PENG Xiang-gui | China Electronic Technology Group Chongqing Acousitc-Optic-Electric Co, Ltd, Chongqing 400060, China |
| CHEN Jia-hui | China Electronic Technology Group Chongqing Acousitc-Optic-Electric Co, Ltd, Chongqing 400060, China |
| LIU Yong-yong | China Electronic Technology Group Chongqing Acousitc-Optic-Electric Co, Ltd, Chongqing 400060, China |
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| 中文摘要: |
| 目的 开发一种脉冲电镀镍钴合金工艺，并研究其镀层的耐腐蚀性能，以期将其应用于光电子器件外壳电镀领域。方法 采用脉冲电镀的方式获得电镀镍钴合金镀层，通过腐蚀失重试验、极化曲线测试以及电化学阻抗谱测试等方法考察镀层的耐腐蚀性能，通过场发射扫描电子显微镜、能谱仪和X射线衍射仪等设备对镀层的表面微观形貌、成分和晶体结构进行了表征，并与传统的电镀氨基磺酸镍工艺进行了抗腐蚀性能的比较。在耐腐蚀性能最优的工艺条件下，对公司某型号光电子器件外壳进行了镍钴合金电镀，并对产品的镀层进行一系列考核。结果 随着Co含量的增加，脉冲电镀镍钴合金镀层的结晶更均匀致密，晶粒、镀层孔隙更小。在3.5%NaCl溶液中，随着Co含量的增加，脉冲电镀镍钴合金镀层的自腐蚀电位正移，自腐蚀电流密度减小，电荷转移电阻增加。Co含量25%的脉冲电镀镍钴合金镀层的自腐蚀电位和自腐蚀电流密度分别为-331 mV和2.26 μA/cm2，电荷转移电阻是212.62 kΩ。产品的镀层质量、引线涂敷强度、引线疲劳等考核均满足相关标准要求。结论 脉冲电镀镍钴合金镀层的耐蚀性随着Co含量的增加而增强。在3.5%的NaCl溶液中，Ni-Co(25%)的镀层自腐蚀电流仅是Ni镀层的44%。开发的脉冲电镀镍钴合金工艺可以应用于光电子器件外壳电镀领域。 |
| 英文摘要: |
| The work aims to develop a pulse electroplating nickel-cobalt alloy process and study the corrosion resistance of the prepared coating, so as to apply such process in the electroplating field of optoelectronic device shell. Pulse electroplating was used to obtain electroplated nickel-cobalt alloy coating, the corrosion resistance of the coating was investigated by corrosion weight loss experiment, polarization curve test and electrochemical impedance spectroscopy test, and the surface morphology, composition and crystal structure of the coating were characterized by field emission scanning electron microscopy, energy spectrometer and X-ray diffractometer. Then, the process was compared with the traditional electroplating nickel sulfamate process in corrosion resistance. Under the corresponding process conditions of optimal corrosion resistance, the nickel-cobalt alloy electroplating was carried out to a certain type of optoelectronic device shell of the company and a series of assessments were carried out on the coating of the product. As the Co content increased, the crystal of the pulse electroplated nickel-cobalt alloy coating was more uniform and dense with smaller grain and coating porosity. In 3.5%NaCl solution, as the Co content increased, the self-corrosion potential of the pulse-plated nickel-cobalt alloy coating was positively shifted, the self-corrosion current density was lowered, and the charge transfer resistance was increased. The self-corrosion potential and the self-corrosion current density of the pulse-plated nickel-cobalt alloy coating with a Co content of 25% were respectively -331 mV and 2.26 μA/cm2, and the charge transfer resistance was 212.62 kΩ. The assessment on coating quality, lead coating strength and lead fatigue of the products met the relevant standards. The corrosion resistance of the pulsed electroplated nickel-cobalt alloy coating increases with the increase of the Co content. In the 3.5% NaCl solution, the self-corrosion current of the Ni-Co (25%) coating is only 44% of that of the Ni coating. The pulse electroplating nickel-cobalt alloy process developed can be applied to the electroplating field of optoelectronic devices shell. |
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