贵宾华,周晖,郑军,马占吉,杨拉毛草,张延帅.偏压对MPP制备AlTiSiN纳米复合涂层结构及性能的影响[J].表面技术,2020,49(1):228-236.
GUI Bin-hua,ZHOU Hui,ZHENG Jun,MA Zhan-ji,YANG La-mao-cao,ZHANG Yan-shuai.Influence of Bias Voltage on Microstructure and Properties of AlTiSiN Nanocomposite Coatings Prepared by MPP[J].Surface Technology,2020,49(1):228-236 |
| 偏压对MPP制备AlTiSiN纳米复合涂层结构及性能的影响 |
| Influence of Bias Voltage on Microstructure and Properties of AlTiSiN Nanocomposite Coatings Prepared by MPP |
| 投稿时间：2019-06-05 修订日期：2020-01-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2020.01.027 |
| 中文关键词: AlTiSiN纳米复合涂层 脉冲磁控溅射 基体偏压 组织结构 力学性能 摩擦学性能 |
| 英文关键词:AlTiSiN nano-composite coatings modulated pulsed power magnetron sputtering substrate bias voltage microstructure mechanical properties tribological behavior |
| 基金项目: |
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| Author | Institution |
| GUI Bin-hua | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
| ZHOU Hui | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
| ZHENG Jun | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
| MA Zhan-ji | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
| YANG La-mao-cao | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
| ZHANG Yan-shuai | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China |
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| 中文摘要: |
| 目的 实现对AlTiSiN纳米复合涂层微观组织结构的调控及力学性能优化。方法 利用可调控脉冲磁控溅射技术，通过调控基体偏压（-50~ -250 V）制备了不同偏压条件下的AlTiSiN纳米复合涂层。采用X射线衍射仪（XRD）、扫描电子显微镜（SEM）、能量色散谱仪（EDS）、原子力显微镜（AFM）、薄膜综合性能测试仪及球盘摩擦试验仪，测试了涂层的微观组织结构、组成成分、表面形貌、力学性能及摩擦学性能。结果 偏压对涂层元素组成影响不大。微观组织结构方面，不同偏压条件下制备AlTiSiN纳米复合涂层的晶面衍射峰宽化现象明显，呈现纳米晶组织结构。-200 V条件下制备的涂层的晶面衍射峰呈“馒头峰”形态，表明涂层结晶性能出现明显下降，呈类非晶组织结构；偏压升至-250 V时，高能离子对涂层生长表面的持续轰击作用，使得涂层生长表面升温明显，导致结晶性能出现明显改善。涂层表面光滑致密，表面粗糙度最低可达1.753 nm。力学性能方面，随基体偏压的升高，涂层硬度在取得最大值后逐渐下降，最高硬度可达25.9 GPa，H/E*系数可达0.13。摩擦学性能方面，偏压为-200 V时，涂层磨损率取得最小值4.7× 10-15 m3/(N×m)。结论 改变基体偏压，成功实现了涂层微观组织结构的调控生长，进而达到了优化涂层组织结构、力学性能及摩擦学性能的目的。 |
| 英文摘要: |
| The work aims to regulate the microstructure and optimize the mechanical properties of AlTiSiN nano-composite coatings. AlTiSiN nanocomposite coatings were deposited through Modulated Pulsed Power Magnetron Sputtering by varying the substrates bias voltage from -50 V to -250 V. XRD, SEM, EDS, AFM, film comprehensive performance tester and ball and disc friction tester were used to test the microstructure, composition, surface morphology, mechanical and tribological properties. From the results, the influence of bias voltage on element composition was not obvious. For microstructure, the diffraction peaks on the crystal face of AlTiSiN coatings prepared under different bias voltage broadened obviously and nano-crystalline appeared. The diffraction peak on the crystal face of the coating prepared under the condition of -200 V was in the shape of "steamed bread peak", which indicated that the crystallization property of the coating was obviously reduced, and the coating had an amorphous-like structure. When the bias voltage rose to -250 V, the high energy ions bombarded the growth surface of the coating continuously, causing the growth surface of the coating to heat up obviously and resulting in obvious improvement of crystallization performance. The surface of the coating was smooth and compact, with the surface roughness as low as 1.753 nm. For mechanical property, with the increase of substrate bias, the hardness of the coating gradually decreased after reaching the maximum value. The maximum hardness and H/E* ratio were 25.9 GPa and 0.13, respectively. As for the wear properties, the lowest wear rate of 4.7×10-15 m3/(N×m) could be achieved when the bias voltage was -200 V. Changing the substrate bias can effectively regulate the microstructure of the coatings and then optimize the microstructure, mechanical properties and tribological properties of the coatings. |
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