李玉阁,袁海,蒋智韬,雷明凯.高功率调制脉冲磁控溅射沉积NbN涂层特征工艺参数研究[J].表面技术,2019,48(8):302-308.
LI Yu-ge,YUAN Hai,JIANG Zhi-tao,LEI Ming-kai.Characteristic Process Parameters of NbN Coatings Deposited by Modulated Pulsed Power Magnetron Sputtering[J].Surface Technology,2019,48(8):302-308 |
| 高功率调制脉冲磁控溅射沉积NbN涂层特征工艺参数研究 |
| Characteristic Process Parameters of NbN Coatings Deposited by Modulated Pulsed Power Magnetron Sputtering |
| 投稿时间：2019-03-25 修订日期：2019-08-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2019.08.040 |
| 中文关键词: NbN涂层 高功率调制脉冲磁控溅射 相组成 硬度 韧性 |
| 英文关键词:NbN coatings Modulated Pulsed Power Magnetron Sputtering phase structure hardness toughness |
| 基金项目:国家自然科学基金（51575077，51601029，U1508218） |
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| Author | Institution |
| LI Yu-ge | Surface Engineering Laboratory, School of Materials Science and Technology, Dalian University of Technology, Dalian 116024, China |
| YUAN Hai | Surface Engineering Laboratory, School of Materials Science and Technology, Dalian University of Technology, Dalian 116024, China |
| JIANG Zhi-tao | Surface Engineering Laboratory, School of Materials Science and Technology, Dalian University of Technology, Dalian 116024, China |
| LEI Ming-kai | Surface Engineering Laboratory, School of Materials Science and Technology, Dalian University of Technology, Dalian 116024, China |
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| 中文摘要: |
| 目的 研究不施加基片温度和固定Ar/N2流量比为64/16的条件下，微脉冲占空比、充电电压特征工艺参数与负偏压对NbN涂层相组成、微结构和力学性能的影响。方法 采用高功率调制脉冲磁控溅射技术（MPPMS），通过控制微脉冲占空比、充电电压和负偏压等特征工艺参数，沉积一系列具有不同相组成的NbN涂层，通过X射线衍射仪、纳米压痕仪和维氏硬度计，分别表征NbN涂层的相组成、结构、硬度和韧性，并通过扫描电子显微镜（SEM）对NbN生长形貌和压痕形貌进行观察分析。结果 改变微脉冲占空比和充电电压，所有NbN涂层均由δ-NbN和δ'-NbN组成，施加基片偏压后，NbN涂层主要由δ'-NbN组成。所有的NbN涂层均呈现致密柱状晶结构，且提高微脉冲占空比、充电电压和负偏压，制备的NbN涂层均更加致密。随微脉冲占空比升高，涂层硬度由25 GPa增至36 GPa，涂层的韧性逐渐增加。提高充电电压制备的NbN涂层，其表现出与控制微脉冲占空比制备的涂层相似的规律。施加负偏压后，涂层主要由δ'-NbN组成，涂层的硬度和韧性均下降。结论 两相结构和高致密性是使NbN涂层硬度和韧性同时增强的主要因素。 |
| 英文摘要: |
| The work aims to deposit a series of NbN coatings with different phase structures under varied micropulse duty cycle, charging voltage and bias voltage by Modulated Pulse Power Magnetron Sputtering (MPPMS) and then study the influence of micropulse duty cycle, charging voltage and bias voltage on the phase structure, microstructure and mechanical properties of NbN coatings without applying substrate temperature and the fixed ratio of Ar/N2 of 64/16. The phase composition, structure, hardness and toughness of NbN coatings were evaluated by X-ray diffraction, nano-indentation test and indentation test, respectively. The cross-sectional morphology and the indentation morphology were analyzed further by scanning electron microscope (SEM). When the micropulse duty cycle and charging voltage changed, all NbN coatings were composed of δ-NbN and δ'-NbN. When the bias voltage increased, NbN coating was mainly composed of δ'-NbN. All NbN coatings exhibited dense columnar crystal structure. As the micropulse duty cycle, the charging voltage and the negative bias voltage increased, the NbN coating became denser. With the increase of micropulse duty cycle, the coating hardness increased from 25 GPa to 36 GPa and the coating toughness also increased. When the charging voltage increased, the NbN coatings exhibited a regulation similar to that of the coatings prepared by controlling the micropulse duty cycle. After the negative bias voltage was applied, the coatings mainly consisted of δ'-NbN, and the hardness and toughness of the coatings were both reduced. The duplex phase structure and high density are the main factors that enhance the hardness and toughness of the NbN coatings. |
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