郭玉垚,王铁钢,李柏松,刘艳梅,蒙德强,许人仁.高功率脉冲和脉冲直流磁控共溅射CrAlN薄膜的研究[J].表面技术,2019,48(4):137-144.
GUO Yu-yao,WANG Tie-gang,LI Bai-song,LIU Yan-mei,MENG De-qiang,XU Ren-ren.CrAlN Coatings Prepared by HiPIMS/Pulsed-DC Co-sputtering[J].Surface Technology,2019,48(4):137-144 |
| 高功率脉冲和脉冲直流磁控共溅射CrAlN薄膜的研究 |
| CrAlN Coatings Prepared by HiPIMS/Pulsed-DC Co-sputtering |
| 投稿时间：2018-12-14 修订日期：2019-04-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2019.04.020 |
| 中文关键词: 高功率脉冲磁控溅射 脉冲直流磁控溅射 CrAlN薄膜 力学性能 磨擦磨损性能 |
| 英文关键词:HiPIMS pulsed-DC magnetron sputtering CrAlN coating mechanical properties friction |
| 基金项目:国家自然科学基金项目（51301181，51875555）；中青年骨干创新人才培养计划项目（RC180203）；天津职业技术师范大学校级科研项目（KJ1812）；研究生创新基金项目（YC18-02） |
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| Author | Institution |
| GUO Yu-yao | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
| WANG Tie-gang | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
| LI Bai-song | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
| LIU Yan-mei | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
| MENG De-qiang | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
| XU Ren-ren | Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China |
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| 中文摘要: |
| 目的 通过掺杂适量Al元素来固溶强化CrN薄膜，从而提高薄膜的抗氧化性能和热稳定性。方法 采用高功率脉冲磁控溅射和脉冲直流磁控溅射复合镀膜技术制备了CrAlN薄膜，利用XRD、纳米压痕仪、应力仪、摩擦磨损试验机系统地研究了不同基体偏压对CrAlN涂层结构和力学性能的影响。结果 所有CrAlN涂层均以fcc-(Cr,Al)N相为主，且随着基体偏压的增加，沿（111）晶面生长的衍射峰逐渐减弱，并向小角度偏移；薄膜压应力显著增加，最大值为-2.68 GPa；薄膜硬度先上升后下降，在基体偏压为-30 V时，硬度达到最大值22.3 GPa；H/E值和H3/E*2值随着基体偏压的增加，近似线性增大，当偏压为-120 V时，均达最大值0.11、0.21 GPa，同时摩擦系数和磨损率逐渐减小。结论 当基体偏压为-120 V时，CrAlN薄膜具有最佳的耐磨性能，H/E和H3/E*2在一定程度上可评价涂层的耐磨性。 |
| 英文摘要: |
| The work aims to strengthen CrN film through solid solution by doping appropriate amount of Al, so as to improve the oxidation resistance and thermal stability of the film. High power impulse magnetron sputtering and pulsed direct current mag-netron sputtering were adopted to deposit Cr-Al-N films and the influence of different substrate biases on the structure and me-chanical properties of the coating was studied by XRD, indentation tester, film stress tester and friction tests. All CrAlN coatings exhibited a face-centered cubic (Cr,Al)N solid solution phase. As the substrate bias increased, the diffraction peaks growing along the (111) plane gradually weakened and shifted toward a small angle; the compressive stress of the film increased remarkably; the hardness of the film rose first and then decreased, and the hardness reached a maximum value of 22.3 GPa when the substrate bias was -30 V. The H/E value and the H3/E*2 value increased approximately linearly with the increase of the substrate bias voltage, and the maximum values were 0.11 and 0.21 at -120 V, respectively, and the friction coefficient and wear rate were gradually reduced. When the substrate bias is -120 V, the CrAlN film has the best wear resistance; H/E and H3/E*2 can be used to evaluate the wear resistance of the coating. |
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