孙康,崔洪芝,田硕硕,宋晓杰,王维国.Zr含量对磁控溅射NiCrZr薄膜结构及耐蚀性的影响[J].表面技术,2019,48(2):186-192.
SUN Kang,CUI Hong-zhi,TIAN Shuo-shuo,SONG Xiao-jie,WANG Wei-guo.Effects of Zr Content on Microstructure and Corrosion Resistance of NiCrZr Thin Film Prepared by Magnetron Sputtering[J].Surface Technology,2019,48(2):186-192 |
| Zr含量对磁控溅射NiCrZr薄膜结构及耐蚀性的影响 |
| Effects of Zr Content on Microstructure and Corrosion Resistance of NiCrZr Thin Film Prepared by Magnetron Sputtering |
| 投稿时间：2018-10-09 修订日期：2019-02-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2019.02.027 |
| 中文关键词: 磁控溅射 NiCrZr薄膜 微观结构 电化学 耐蚀性 |
| 英文关键词:magnetron sputtering NiCrZr film microstructure electrochemical corrosion resistance |
| 基金项目:国家高技术研究发展计划（863计划2015AA034404）；国家自然科学基金（51772176）；泰山学者攀登计划（tspd20161006） |
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| Author | Institution |
| SUN Kang | Shandong University of Science and Technology, Qingdao 266590, China |
| CUI Hong-zhi | Shandong University of Science and Technology, Qingdao 266590, China |
| TIAN Shuo-shuo | Shandong University of Science and Technology, Qingdao 266590, China |
| SONG Xiao-jie | Shandong University of Science and Technology, Qingdao 266590, China |
| WANG Wei-guo | Shandong University of Science and Technology, Qingdao 266590, China |
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| 中文摘要: |
| 目的 在316L不锈钢基体表面磁控溅射NiCrZr薄膜，提高其在3.5%NaCl溶液中的耐蚀性。方法 采用非平衡磁控溅射技术，在316L不锈钢基体上，用NiCr（原子比80 : 20）复合靶和纯Zr靶制备了不同Zr含量的NiCrZr薄膜。采用XRD、原子力显微镜、扫描电镜和Gamry电化学工作站，分别分析了NiCrZr薄膜的物相组成、表面形貌、表面粗糙度、截面形貌、元素组成、厚度以及在3.5%NaCl溶液中的电化学腐蚀性能。结果 随着Zr靶功率的增加，薄膜中Zr含量不断增加，薄膜的组织结构不断细化，表面粗糙度由4.91 nm减小到了2.79 nm。薄膜主要由Cr3Ni2、Cr1.2Ni0.8Zr、Cr2Zr、CrO3、NiCrO4和ZrO2相组成，表明薄膜容易在空气中氧化。此外，随着Zr含量的增加，与316L基体相比，NiCrZr薄膜在3.5%NaCl溶液中的腐蚀电流减小，腐蚀电位增大。当Zr原子分数为24.73%时，NiCrZr薄膜可以在溶液中形成稳定的钝化膜，从而表现出最佳的耐蚀性，腐蚀电流密度达到最小值13.10 nA/cm2，与316L基体相比减小了95%。结论 Zr含量的增加可以使薄膜变得更加细密，有效阻隔电解质与基体的接触，从而提高涂层的耐蚀性。 |
| 英文摘要: |
| The work aims to form NiCrZr film on the 316L stainless steel by magnetron sputtering to improve the corrosion resistance in 3.5%NaCl solution. NiCrZr films with different Zr contents were prepared on 316L stainless steel substrates with NiCr (80at% : 20at%) composite target and pure Zr target by unbalanced magnetron sputtering. The phase composition, surface morphology, roughness, cross-sectional morphology, composition of the elements, thickness and the corrosion resistance in 3.5%NaCl solution were analyzed by XRD, AFM, SEM and Gamry electrochemical workstation, respectively. With the increase of Zr target power, the content of Zr in the film increased, the microstructure of the film was refined, and the surface roughness was reduced from 4.91 to 2.19 nm. The films were mainly composed of Cr3Ni2, Cr1.2Ni0.8Zr, Cr2Zr, CrO3, NiCrO4 and ZrO2, so the film was easily oxidized in air. Furthermore, with the increase of Zr content, the corrosion current of NiCrZr film in 3.5%NaCl solution decreased and the corrosion potential increased compared with the 316L substrate. When the Zr content was 24.73% (at%), the NiCrZr thin films exhibited the best corrosion resistance due to the formation of stable passivation layer in 3.5%NaCl solution, and the corrosion current density reached a minimum value of 13.10 nA/cm2, which was reduced by 19 times compared with 248.5 nA/cm2 of 316L. Thus, the increase of the Zr content can make the film denser, and can effectively improve the corrosion resistance of the coating by impeding the contact between the electrolyte and the substrate. |
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