刘孝丽,熊玉卿,周利成,王瑞,钟浩,任立庆,任妮.激光刻蚀2 μm铝/聚酰亚胺（PI）材料体系技术研究[J].表面技术,2018,47(10):321-327.
LIU Xiao-li,XIONG Yu-qing,ZHOU Li-cheng,WANG Rui,ZHONG Hao,REN Li-qing,REN Ni.Technological Study on Laser Etching of 2 μm Aluminum Film/PI Material System[J].Surface Technology,2018,47(10):321-327 |
| 激光刻蚀2 μm铝/聚酰亚胺（PI）材料体系技术研究 |
| Technological Study on Laser Etching of 2 μm Aluminum Film/PI Material System |
| 投稿时间：2018-01-18 修订日期：2018-10-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.10.044 |
| 中文关键词: 激光束刻蚀 铝/聚酰亚胺 图形形貌 扫描速度 应力 |
| 英文关键词:laser beam etching aluminum/polyimide pattern morphology scanning speed stress |
| 基金项目:榆林学院科研启动基金（17GK09） |
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| Author | Institution |
| LIU Xiao-li | 1.School of Energy Engineering, Yulin University, Yulin 719000, China |
| XIONG Yu-qing | 2.Key Laboratory of Vacuum Technology and Physics, Lanzhou Institute of Physics, Lanzhou 730000, China |
| ZHOU Li-cheng | 1.School of Energy Engineering, Yulin University, Yulin 719000, China |
| WANG Rui | 2.Key Laboratory of Vacuum Technology and Physics, Lanzhou Institute of Physics, Lanzhou 730000, China |
| ZHONG Hao | 1.School of Energy Engineering, Yulin University, Yulin 719000, China |
| REN Li-qing | 1.School of Energy Engineering, Yulin University, Yulin 719000, China |
| REN Ni | 2.Key Laboratory of Vacuum Technology and Physics, Lanzhou Institute of Physics, Lanzhou 730000, China |
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| 中文摘要: |
| 目的 研究对激光刻蚀图形形貌可能产生影响的几个参数，如激光功率、填充比等，优化激光束刻蚀制备2 μm铝膜/PI的工作参数，提高刻蚀质量。方法 利用ANSYS软件对激光刻蚀2 μm铝膜/PI过程中薄膜铝表面的能量传输及转化过程进行模拟，了解刻蚀形貌与单个脉冲的激光工艺参数的关系。根据模拟结果，使用LSP2000激光器，采用不同的激光输出功率和扫描方式、填充比等参数对样品进行刻蚀。利用扫描电镜等对激光刻蚀制备后的样品表面形貌进行研究，从而获得优化工艺参数。结果 采用波长为1064 nm的Nd:YAG激光器，利用蛇形扫描方式及45°方向填充，填充密度为0.03 mm，在激光功率5 W、激光频率20 kHz、脉宽100 ns、光斑直径40 μm、激光扫描速度为565.7 mm/s的工艺参数下，刻蚀边界整齐。结论 纳秒刻蚀过程既有光热去除，也有应力去除，激光刻蚀工艺参数的优化在一定程度上改善了刻蚀边界质量，有利于提高激光刻蚀精度。 |
| 英文摘要: |
| The work aims to study the parameters affecting morphology of laser etched patterns such as laser power and filling density, optimize working parameters for laser beam etching of 2 μm aluminum film/PI, and further improve etching quality. Finite element software ANSYS was adopted to simulate energy transfer and conversion process on Al film during laser etching of 2 μm aluminum film/in PI process, and reveal the relationship between etching morphology and laser process parameters of a single pulse. Based on the simulation results, Al film on polyimide substrate was etched with a LSP2000 laser etching system in the combinations of different laser power, scanning mode and filling density. Surface morphology of the laser etched sample was analyzed with scanning electron microscope (SEM). Neat etching edges of 2 μm Al/PI could be obtained under following parameters: a 1064 nm Nd: YAG laser with frequency of 20 kHz, pulse width of 100 ns, spot diameter of 40 μm, laser power of 5 W, radial scanning pitch of 0.04 mm, serpentine scanning mode, filling in direction of 45°, filling density of 0.03 mm, and scanning speed of 565.7 mm/s. Nanosecond etching process involves not only thermal interaction but also stress removal. Optimization of laser etching process parameter scan be used to obtain smooth etching edges and improve accuracy of laser etching. |
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