苗虎,李刘合,韩明月,谷佳宾.原子层沉积技术及应用[J].表面技术,2018,47(9):163-175.
MIAO Hu,LI Liu-he,HAN Ming-yue,GU Jia-bin.Atomic Layer Deposition Technology and Its Application[J].Surface Technology,2018,47(9):163-175 |
| 原子层沉积技术及应用 |
| Atomic Layer Deposition Technology and Its Application |
| 投稿时间：2018-06-01 修订日期：2018-09-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.09.022 |
| 中文关键词: 原子层沉积 自限制 前驱体 纳米催化剂 电池 半导体 光学 生物医学 航空航天 |
| 英文关键词:ALD, self-limited precursor nano-catalyst electric battery semiconductor device optics bio-medicine aerospace |
| 基金项目:武器装备预研基金（61409230602） |
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| 中文摘要: |
| 简单阐述了原子层沉积技术的发展背景，然后概括了原子层沉积技术原理、技术特征和优势，并对化学吸附和顺次反应两种自限制机制进行了描述和比较。着重介绍了原子层沉积技术在工艺等方面的最新成果，以及在纳米催化剂、电池、半导体器件、光学、生物医学和航空航天领域中的相关应用。其中将原子层沉积在电池、半导体器件和生物医学方面的应用进行了分类介绍。电池方面包括锂离子电池和太阳能电池，半导体器件方面分为高k电介质、电容器、电阻随机存取存储器（RRAM）和光、电二极管。生物医学领域分别介绍了其在生物相容性、抑菌抗菌涂层和微观组分方向的研究进展。最后对原子层沉积技术进行了归纳总结，并展望了其未来的发展方向和应用前景。 |
| 英文摘要: |
| The development background of atomic layer deposition technology was briefly described. Then, technical principles, technical characteristics and advantages of atomic layer deposition technology were summarized, and the two self-limiting mechanisms of chemical adsorption and sequential reaction were described and compared. Hereafter, the latest results of the atomic layer deposition technology in process and other applications in nanocatalysts, batteries, semiconductor devices, optics, biomedicine and aerospace were highlighted. Among them, the applications of atomic layer deposition in batteries, semiconductor devices and biomedical applications were classified and introduced. The batteries included lithium ion batteries and solar cells. The semiconductor devices were divided into high-k dielectrics, capacitors, and resistor random access memory (RRAM), photodiode. In biomedical fields, the research progress in biocompatibility, antibacterial coatings and microscopic component directions were displayed, respectively. In the end, it summarized and prospected the development direction and application of atomic layer deposition technology. |
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