窦志强,肖长江,栗正新.金刚石表面刻蚀技术研究进展[J].表面技术,2018,47(4):90-95.
DOU Zhi-qiang,XIAO Chang-jiang,LI Zheng-xin.Research Progress of Diamond Surface Etching Technology[J].Surface Technology,2018,47(4):90-95 |
| 金刚石表面刻蚀技术研究进展 |
| Research Progress of Diamond Surface Etching Technology |
| 投稿时间：2017-10-24 修订日期：2018-04-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.04.013 |
| 中文关键词: 金刚石 表面刻蚀 等离子刻蚀 熔盐刻蚀 气相刻蚀 固相刻蚀 |
| 英文关键词:diamond surface etching plasma etching molten salt etching gas phase etching solid phase etching |
| 基金项目:河南省教育厅自然科学基金资助项目（15A430022） |
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| 中文摘要: |
| 金刚石在量子信息器件、生物医药载体、生物传感器、高性能电极、化学分析传感器等诸多领域具有极大的应用价值，金刚石表面刻蚀技术是实现金刚石上述应用的关键所在。常见的刻蚀技术可根据刻蚀剂的物相分为熔盐刻蚀、气相刻蚀、固相刻蚀、气固相混合刻蚀、等离子刻蚀这五类。熔盐刻蚀是利用熔融离子化合物对金刚石表面进行刻蚀，其刻蚀机理主要是金刚石碳原子的氧化过程。气相刻蚀是利用氧气等气体与金刚石表面发生气固相反应，使金刚石中的碳原子变为一氧化碳等气态化合物进行刻蚀。气固相混合刻蚀主要是以镍、铂等金属作为催化剂，辅助氢气与金刚石发生反应生成甲烷，对金刚石进行刻蚀。固相刻蚀是金刚石合成的逆过程，主要用铁钴镍及其盐对金刚石进行催化石墨化，之后这些金属作为溶剂形成碳固溶体对金刚石进行刻蚀。等离子体刻蚀主要是用氧等离子体与金刚石发生反应，对金刚石进行刻蚀。文章着重介绍了这五种金刚石表面刻蚀技术近年来的研究进展，简要分析了这些技术的原理、特点与用途。 |
| 英文摘要: |
| Diamond is of great application value in various fields including quantum information device, biomedical carrier, biosensor, high performance electrode and chemical analysis sensor. Diamond surface etching technology is the key to realizing abovementioned applications of diamond. According to phase of etchant, common etching technologies can be classified into molten salt etching, gas phase etching, solid phase etching, gas solid phase mixing etching and plasma etching. Molten salt etching uses molten ion compounds to etch diamond surfaces, and its etching mechanism is mainly oxidation process of diamond carbon atoms. Gas phase etching transforms carbon atoms in the diamond into other gaseous compounds including carbon monoxide for etching based upon gas-solid phase reaction between gases including oxygen and diamond surface. Gas-solid phase etching enhances reaction between hydrogen and diamond to produce methane for diamond etching with nickel, platinum and other metals as catalysts. Solid phase etching is reverse process of diamond synthesis, which mainly applies catalytic graphitization to the diamond with iron cobalt nickel and its salt, later these metals form carbon solid solution as a solvent for diamond etching. Plasma etching mainly realizes diamond etching based upon reaction between diamond and plasma like oxygen. This paper emphatically introduces research progress of these five kinds of diamond surface etching technology, and briefly analyzes principle, characteristics and purpose of these technologies. |
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