刘金龙,安康,陈良贤,魏俊俊,唐伟忠,吕反修,李成明.CVD金刚石自支撑膜的研究进展[J].表面技术,2018,47(4):1-10.
LIU Jin-long,AN Kang,CHEN Liang-xian,WEI Jun-jun,TANG Wei-zhong,LYU Fan-xiu,LI Cheng-ming.Research Progress of Freestanding CVD Diamond Films[J].Surface Technology,2018,47(4):1-10 |
| CVD金刚石自支撑膜的研究进展 |
| Research Progress of Freestanding CVD Diamond Films |
| 投稿时间：2018-02-07 修订日期：2018-04-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.04.001 |
| 中文关键词: 化学气相沉积 热丝化学气相沉积 直流辅助等离子体化学气相沉积 直流电弧等离子体化学气相沉积 微波等离子体化学气相沉积 自支撑金刚石膜 |
| 英文关键词:CVD hot filament CVD direct current plasma assisted CVD DC Arc Plasma Jet CVD microwave plasma CVD free-standing diamond film |
| 基金项目:国家重点研发计划（2016YFE0133200） |
|
|
| Author | Institution |
| LIU Jin-long | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| AN Kang | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| CHEN Liang-xian | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| WEI Jun-jun | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| TANG Wei-zhong | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| LYU Fan-xiu | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
| LI Cheng-ming | Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 金刚石膜以其最高的硬度、热导率、热震性能以及极高的强度等优点得到了越来越多的关注。自20世纪低压化学气相沉积技术成功制备出金刚石以来，在世界范围内，金刚石的制备技术及应用研究得到了快速发展。分别对国内外自支撑金刚石膜材料的制备技术及相关应用进行简要介绍，并讨论近几年我国在高质量金刚石膜材料制备技术方面取得的进展。目前主要的制备技术有热丝、直流辅助等离子体、直流电弧等离子体喷射、微波等离子体化学气相沉积（CVD）等方法。在小尺寸、高质量金刚石膜的制备技术基础上，21世纪初，国外几大技术强国先后宣布实现了大面积、高质量CVD金刚石膜的制备，并将其用于诸如红外光学窗口等高技术领域。我国也在CVD金刚石膜研发方面不断进步，先后掌握了热丝、直流电弧等离子体喷射、直流辅助等离子体CVD等合成大面积金刚石自支撑膜技术，近几年也掌握了915 MHz微波等离子体CVD技术，这些成果也标志着我国在高质量金刚石膜制备技术领域跟上了世界先进水平。 |
| 英文摘要: |
| As a combination of highest harness, thermal conductivity, thermal shock resistance and high strength, diamond film has attracted a large number of researches. From the 20th century when diamond was prepared by chemical vapor deposition (CVD) at low pressure, the related deposition science and technology have rapidly developed. In this article, a review on techniques aims at producing diamond wafers useful for infrared windows will be presented, and special attention will be given to the recent progress made in China to produce high quality diamond wafers. Until now, Hot Filament CVD, Direct Current Plasma Assisted CVD, DC Arc Plasma Jet CVD and Microwave Plasma CVD have been still developing. On the basis of research on high quality diamond films with small size, in the early 21st century, several foreign developed countries have declared mastering the techniques to deposit high-quality diamond wafers with large area and the films have been used in high-tech areas, such as infrared optical window, et al. Hot Filament CVD, DC Arc Plasma Jet CVD and Direct Current Plasma Assisted CVD have been mastered in China because the diamond techniques have also been developed rapidly. Recently, a novel system of 915 MHz microwave plasma CVD developed successfully, which illustrates the technique for preparing high-quality diamond film in China has kept up with the advanced level abroad. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号