翁俊,刘繁,孙祁,汪建华.CO2-CH4沉积气氛中金刚石膜晶粒尺寸的控制研究[J].表面技术,2018,47(1):211-217.
WENG Jun,LIU Fan,SUN Qi,WANG Jian-hua.Investigation on the Grain Size Control of Diamond Films in CO2-CH4 Gas Mixture[J].Surface Technology,2018,47(1):211-217
CO2-CH4沉积气氛中金刚石膜晶粒尺寸的控制研究
Investigation on the Grain Size Control of Diamond Films in CO2-CH4 Gas Mixture
投稿时间:2017-05-26  修订日期:2018-01-20
DOI:10.16490/j.cnki.issn.1001-3660.2018.01.033
中文关键词:  微米金刚石膜  纳米金刚石膜  无氢气沉积  可控性生长  微波等离子体
英文关键词:microcrystalline diamond film  nanocrsrystalline diamond film  hydrogen-free deposition  controllable growth  microwave plasma
基金项目:国家自然科学基金项目(11175137);湖北省教育厅基金项目(W20151517);武汉工程大学科学研究基金项目(K201506)
作者单位
翁俊 武汉工程大学 湖北省等离子体化学与新材料重点实验室,武汉430205 
刘繁 武汉工程大学 湖北省等离子体化学与新材料重点实验室,武汉430205 
孙祁 武汉工程大学 湖北省等离子体化学与新材料重点实验室,武汉430205 
汪建华 武汉工程大学 湖北省等离子体化学与新材料重点实验室,武汉430205 
AuthorInstitution
WENG Jun Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430205, China 
LIU Fan Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430205, China 
SUN Qi Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430205, China 
WANG Jian-hua Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430205, China 
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中文摘要:
      目的 在无氢气沉积环境中研究CO2与CH4的流量比对金刚石膜生长及晶粒尺寸的影响规律。方法 采用MPCVD技术,通过调控CO2与CH4的流量比,可控性地制备得到不同结构特征的金刚石膜,通过SEM、XRD以及Raman光谱对金刚石膜进行表征分析,获得CO2与CH4的流量比对金刚石膜晶粒尺寸的影响规律。结果 在微波功率、沉积气压、基片温度和CH4流量分别为1.2 kW、7.0 kPa、850 ℃和50 mL/min的沉积环境下,当CO2流量为20和25 mL/min时,可制备得到纳米金刚石膜;当CO2流量为30和35 mL/min时,可制备得到微米金刚石膜;当CO2流量为67 mL/min时,可获得金刚石颗粒。在保持其他工艺条件不变时,通过调控微波功率分别为0.9、1.4和1.8 kW,金刚石膜的晶粒尺寸随CO2/CH4的变化可分为:纳米金刚石膜区(CO2/CH4<50%)、微米金刚石膜区(CO2/CH4>60%)及纳米-微米过渡区(50%
英文摘要:
      The work aims to study law of influence of CO2/CH4 flow ratio on growth of diamond films and grain size. The diamond films exhibiting different structural features were prepared controllably by adjusting the CO2/CH4 flow ratio and applying MPCVD technology. The diamond films were characterized and analyzed with scanning electron microscope, X-ray diffractometer and Raman spectrum, the rule of influence of CO2/CH4 flow ratio on grain size of diamond films was obtained. When microwave power, deposition pressure, substrate temperature and of CH4 flow was 1.2 kW, 7.0 kPa, 850 ℃ and 50 mL/min, respectively, nanocrystalline diamond films could be deposited using 20 and 25 mL/min CO2, microcrystalline diamond films could be obtained using 30 and 35 mL/min CO2, and diamond could be deposited using 67 mL/min CO2. By adjusting microwave power to 0.9, 1.4, 1.8 kW, respectively while keeping the other parameters constant, grain size variation of diamond films along with the CO2/CH4 flow ratio could be divide into three regions: nanocrystalline diamond film deposition region (CO2/CH4<50%), microcrystalline diamond film deposition region (CO2/CH4>60%), and grain size transition region (50%
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