惠迎雪,王钊,贺爱峰,徐均琪.室温下反应磁控溅射沉积氧化钛薄膜光学性能和力学性能研究[J].表面技术,2016,45(11):167-172.
XI Ying-xue,WANG Zhao,HE Ai-feng,XU Jun-qi.Optical and Mechanical Properties of TiO2 Films Prepared by DC Magnetron Sputtering at Room-Temperature[J].Surface Technology,2016,45(11):167-172 |
| 室温下反应磁控溅射沉积氧化钛薄膜光学性能和力学性能研究 |
| Optical and Mechanical Properties of TiO2 Films Prepared by DC Magnetron Sputtering at Room-Temperature |
| 投稿时间：2016-01-22 修订日期：2016-11-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2016.11.026 |
| 中文关键词: 反应磁控溅射 氧化钛薄膜 折射率 纳米硬度 |
| 英文关键词:reactive magnetron sputtering TiO2 films refractive index nano-hardness |
| 基金项目:国家自然科学基金项目(61378050)；陕西省科技厅重点实验室项目（2013SZS14-Z02） |
|
|
| Author | Institution |
| XI Ying-xue | School of Optoelectronic Engineering, Xi′an Technological University, Xi′an 710021, China |
| WANG Zhao | School of Optoelectronic Engineering, Xi′an Technological University, Xi′an 710021, China |
| HE Ai-feng | State Key Laboratory of Applied Physics-Chemistry, Shaanxi Applied Physics and Chemistry Research Institute, Xi′an 710061, China |
| XU Jun-qi | School of Optoelectronic Engineering, Xi′an Technological University, Xi′an 710021, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 目的 通过对比不同溅射功率和氧气分压下氧化钛薄膜性能的变化规律，分析其力学性能和光学性能的关系。 方法 在室温条件下，采用直流反应磁控溅射技术在 K9 玻璃基底上沉积 TiO2薄膜，通过紫外可见红外分光光度计和椭偏仪对薄膜的光学特性进行分析，通过微纳米压痕技术对薄膜的力学性能进行表征。 结果 在给定工艺参数范围内，薄膜的光学折射率与纳米硬度和弹性模量正相关，随着溅射靶功率的增大，所制备薄膜的折射率、纳米硬度和弹性模量随之增大，而薄膜的光学带隙则随着溅射功率的增大而下降。同时， O2流量对薄膜的光学性能和力学性能的影响更明显，在较低 O2流量条件下（Q(Ar)/Q(O2)=10/1），所制备薄膜的折射率减小而光学带隙变大，随着 O2 流量进一步减少（Q(Ar)/Q(O2)=20/1），薄膜的折射率增大而光学带隙减小，但薄膜的纳米硬度和弹性模量随 O2流量的减少而下降。 结论 磁控溅射沉积 TiO2 薄膜的折射率与其光学带隙反向相关，而仅在适量氧气条件下所制备的薄膜的力学性能与光学特性有相关性。 |
| 英文摘要: |
| The work aims to analyze the relationship between mechanical and optical properties of TiO2 films by comparing the variation of TiO2 films at different sputtering power and oxygen tension. TiO2 films were deposited on K9 glass substrate by virtue of DC reactive magnetron sputtering method at room temperature. UV-Vis spectrophotometer and Ellipsometer were used to characterize the optical properties of the TiO2 films, and their mechanical performance was tested by utilizing nanoindentation technology. It showed that the optical refractive index of the TiO2 films was positively correlated with their nano hardness and elastic modulus within a given range of process parameters. Film refractive index, nano hardness and elastic modulus increased while optical band gap of the fims decreased as the sputtering power increased. Meanwhile, during the deposition process, the O2 flow rate had significant effects on optical and mechanical properties of the TiO2 films. When the O2 mass flow rate reduced from Q(Ar)/Q(O2)=5/1 to 10/1, the refractive indexes of the films decreased while the optical band gap increased. However, when the O2 mass flow rate reduced to Q(Ar)/Q(O2)=20/1, the refractive indexes of the films increased and exceeded that obtained at Q(Ar)/Q(O2)=5/1, and the band gap decreased and was lower than that obtained at Q(Ar)/Q(O2)=10/1. Beyong that, the nano-hardness and elastic modulus of the films continuously decreased as the O2 mass flow rate decreased. The refractive index and optical band gap of the TiO2 films deposited by magnetron sputtering are inverse correlated. Furthermore, the optical band gap is correlated with mechanical properties of the films prepared at certain O2 mass flow only. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号