杜军,杨吉哲,王尧.Zr/C纳米自蔓延反应薄膜制备及表征[J].表面技术,2016,45(8):98-102.
DU Jun,YANG Ji-zhe,WANG Yao.Preparation and Characterization of Zr/C Nanometer Self-propagating Reaction Thin Film[J].Surface Technology,2016,45(8):98-102
Zr/C纳米自蔓延反应薄膜制备及表征
Preparation and Characterization of Zr/C Nanometer Self-propagating Reaction Thin Film
投稿时间:2016-04-12  修订日期:2016-08-20
DOI:10.16490/j.cnki.issn.1001-3660.2016.08.017
中文关键词:  磁控溅射  Zr/C纳米薄膜  自蔓延反应  制备工艺  表征
英文关键词:magnetron sputtering  Zr/C nano-film  self-propagating reaction  preparation process  characterization
基金项目:国家自然科学基金项目(51102283);重点实验室基金项目(zx1318)
作者单位
杜军 装甲兵工程学院 再制造技术国家重点实验室,北京 100072 
杨吉哲 装甲兵工程学院 机械系,北京 100072 
王尧 装甲兵工程学院 再制造技术国家重点实验室,北京 100072 
AuthorInstitution
DU Jun National Key Laboratory for Remanufacturing, Academy of Armored Force Engineering, Beijing 100072, China 
YANG Ji-zhe Department of Mechanical Engineering, Academy of Armored Force Engineering, Beijing 100072, China 
WANG Yao National Key Laboratory for Remanufacturing, Academy of Armored Force Engineering, Beijing 100072, China 
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中文摘要:
      目的 研究物理气相沉积技术制备Zr/C纳米多层自蔓延反应薄膜的可行性,以及多层膜的结构和反应特征。方法 利用扫描电镜法(SEM)、透射电镜法(TEM)、能谱分析法(EDS)、X射线衍射法(XRD)、差示扫描量热法(DSC)等手段,对薄膜的微观形貌、周期结构、成分组成、晶体结构及反应特征等进行表征,分析了薄膜的沉积时间、结构周期、层间结构、反应温度等工艺参数对多层膜结构和性能的影响。结果 Zr层的沉积速率为27 nm/min,C层的沉积速率为11.8 nm/min。薄膜中存在单质Zr(002)和Zr(101)峰,C以非晶形态存在。Zr/C多层膜的表面形貌呈“菜花状”,Zr层与C层结构清晰,分布均匀。透射电镜观察Zr层与C层界面,发现两者之间存在一定厚度的界面反应层,表明沉积过程中两者之间发生了轻微扩散或是预先反应。DSC发现,600 ℃时Zr/C多层膜发生放热反应,但反应前后多层膜质量未发生明显变化。结论 利用物理气相沉积技术可制备较纯的Zr/C纳米多层自蔓延反应薄膜,自蔓延反应时,Zr层与C层之间发生快速的剧烈放热反应,并有ZrC生成,无其他产物生成。
英文摘要:
      Objective In order to investigate the feasibility of preparing Zr/C nanometer multilayer self-propagating reaction film by physical vapor deposition technique as well as the structure and reaction process of multilayer film. Methods Scanning electron microscope (SEM), transmission electron microscope (TEM), energy dispersion analysis (EDS), X-ray diffraction method (XRD) and differential scanning calorimetry (DSC) were employed to evaluate film’s microscopic morphology, periodic structure, composition, crystal structure and reaction characteristics. The influence of film’s structural cycle, deposition time, reaction temperature, interlayer structure and other technological parameters on multilayer film structure and property was analyzed. Results The deposition rates of Zr and C were 27 and 11.8 nm/min respectively; Zr(002) and Zr(101) peaks were found in the film, and C existed as amorphous phase. The surface morphology of Zr/C multilayer film showed “cauliflower-like” shape, cross-sectional morphologies of Zr layer and C layer were smooth and clear. TEM showed that there was a sufficient thickness of interface reaction layer at the interfaces of Zr layer and C layer, which indicated diffusion process occurred during deposition. Exothermic reaction was found appearing at 600 ℃ by DSC, but the weight before and after reaction had no evident change. Conclusion The fairly pure Zr/C nanometer multilayer self-propagating reaction film can be prepared by physical vapor deposition. Acute exothermic reaction exists between Zr layer and C layer during self-propagating reaction and ZrC is produced. No other products are formed.
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