宋沂泽,高原,董中新,张焱,彭凯,王成磊.多弧离子镀负偏压对氮化钛薄膜的影响[J].表面技术,2015,44(11):1-6,28.
SONG Yi-ze,GAO Yuan,DONG Zhong-xin,ZHANG Yan,PENG Kai,WANG CHENG-lei.Influence of Negative Bias on TiN Film Deposited by Multi-arc Ion Plating[J].Surface Technology,2015,44(11):1-6,28
多弧离子镀负偏压对氮化钛薄膜的影响
Influence of Negative Bias on TiN Film Deposited by Multi-arc Ion Plating
投稿时间:2015-08-24  修订日期:2015-11-20
DOI:10.16490/j.cnki.issn.1001-3660.2015.11.001
中文关键词:  多弧离子镀  氮化钛  负偏压  耐磨性  结合力  硬度
英文关键词:MAIP  TiN  negative bias voltage  wear resistance  fording force  hardness
基金项目:国家自然科学基金资助项目(51264007);国家自然科学基金青年基金(51201043);广西科学研究与技术开发科技攻关计划(12118020-2-2-1);广西信息材料重点实验室(桂林电子科技大学)资助(1210908-10-Z);桂林电子科技大学-桂林电科院研究生联合培养基地专项经费资助(20121225-10-Z; 20121225-03-Z)
作者单位
宋沂泽 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
高原 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
董中新 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
张焱 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
彭凯 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
王成磊 1. 广西信息材料重点实验室, 广西 桂林 541004; 2. 桂林电子科技大学 材料学院, 广西 桂林 541004;3. 桂林广陆数字测控股份有限公司, 广西 桂林 541004 
AuthorInstitution
SONG Yi-ze 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
GAO Yuan 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
DONG Zhong-xin 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
ZHANG Yan 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
PENG Kai 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
WANG CHENG-lei 1. Guangxi Key Laboratory of Information Materials, Guilin 541004, China;2. School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China;3. Guilin Guanglu Measuring Instrument Co. , Ltd, Guilin 541004, China 
摘要点击次数:
全文下载次数:
中文摘要:
      目的 确定适当的负偏压,提高多弧离子镀氮化钛薄膜的综合性能。 方法 采用不同的负偏压,在 4Cr13 不锈钢表面制备 TiN 薄膜,探讨偏压对薄膜表面质量、结构、硬度、结合力和摩擦系数的影响。 结果 负偏压对薄膜表面质量的影响较大:负偏压为0 V 时,TiN 薄膜表面凹凸不平,液滴较多;随着负偏压升高,薄膜表面变得光滑,液滴减少并变小,薄膜致密性也得到提高。 在不同负偏压下,TiN 薄膜均呈现出在(111)晶面的择优取向,但随着负偏压的增大,这种择优取向逐渐减弱,当负偏压达到 400 V时,薄膜在(220)晶面的峰值逐渐增强。 随着负偏压从 0 增至 400 V,薄膜的硬度、结合力和耐磨性均先提高,后降低。 当负偏压为 300 V 时,薄膜的硬度和结合力达到最大,分别为 2650HV 和 58 N;摩擦系数和磨损量最小,分别为 0. 48 和 0. 1065 mm3。 结论 施加适当的负偏压可以提高薄膜的硬度、结合力、耐磨性等性能,当负偏压为 300 V 时,薄膜的各项性能达到最佳。
英文摘要:
      Objective In order to improve the comprehensive performance of TiN coatings, the appropriate negative bias was in- vestigated. Methods TiN coatings were deposited with different negative bias voltage on the surface of 4Cr13 stainless steel, and the effect of negative bias voltage on the surface quality, microstructure, hardness, binding force and friction coefficient of the coa- tings was investigated. Results The results showed that negative bias voltage had an obvious influence on the surface quality of the TiN coating. When the negative bias voltage was 0 V, there were many droplets, larger particles and a few pits. With the increase of the bias voltage, the number and size of droplets on the film surface were reduced, and the coatings surface became smooth and more compact. TiN films deposited at different bias voltage all showed preferred orientation in (111) crystal plane, but with the increase of bias voltage, the preferred orientation gradually diminished, when the bias voltage was 400 V, the peak value of the film on the (220) crystal plane was gradually strengthened. When the bias voltage changed between 0 V and 400 V, the hardness, fording force and abrasion resistance of coatings first increased and then decreased. When the bias voltage was 300 V, the biggest hardness and fording force reached 2650HV and 58 N, respectively; The friction coefficient and abrasion loss were 0. 48 and 0. 1065 mm3, respec- tively. Conclusion Applying proper negative bias voltage could improve the comprehensive properties of coatings, such as hardness, fording force and abrasion resistance. When the bias voltage was 300 V, the TiN film deposited showed the best properties.
查看全文  查看/发表评论  下载PDF阅读器
关闭

关于我们 | 联系我们 | 投诉建议 | 隐私保护 | 用户协议

您是第13593475位访问者    渝ICP备15012534号-3

版权所有:《表面技术》编辑部 2014 surface-techj.com, All Rights Reserved

邮编:400039 电话:023-68792193传真:023-68792396 Email: wjqkbm@163.com

渝公网安备 50010702501715号