邹文兵,刘德福,胡庆,陈广林.阵列光纤组件端面的化学机械抛光试验研究[J].表面技术,2015,44(4):132-136,146.
ZOU Wen-bing,LIU De-fu,HU Qing,CHEN Guang-lin.Experimental Research on Chemical Mechanical Polishing of End Face of Optical Fiber Array[J].Surface Technology,2015,44(4):132-136,146
阵列光纤组件端面的化学机械抛光试验研究
Experimental Research on Chemical Mechanical Polishing of End Face of Optical Fiber Array
投稿时间:2015-01-08  修订日期:2015-04-20
DOI:10.16490/j.cnki.issn.1001-3660.2015.04.024
中文关键词:  阵列光纤组件端面  化学机械抛光  表面粗糙度  光纤凸起量
英文关键词:end face of optical fiber array  chemical mechanical polishing  surface roughness  fiber projection
基金项目:国家自然科学基金(51275534);湖南省自然科学基金(2015JJ2153)
作者单位
邹文兵 中南大学 机电工程学院, 长沙 410083 
刘德福 中南大学 机电工程学院, 长沙 410083 
胡庆 中南大学 机电工程学院, 长沙 410083 
陈广林 中南大学 机电工程学院, 长沙 410083 
AuthorInstitution
ZOU Wen-bing School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China 
LIU De-fu School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China 
HU Qing School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China 
CHEN Guang-lin School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China 
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中文摘要:
      目的 设计合理的抛光工艺方案,获得平整的阵列光纤组件端面。 方法 采用单因素实验法研究抛光工艺参数对阵列光纤表面粗糙度与光纤凸起量的影响,利用光学表面轮廓仪与扫描电镜进行分析与观察。 结果 在抛光液磨粒质量分数为 2% ,抛光液流量为 15 mL/ min,抛光压力为 50 kPa,抛光盘转速为 30 r/ min 的条件下,可以获得平整的阵列光纤组件端面。 结论 应用化学机械抛光技术加工阵列光纤组件,并设计合理工艺方案,可获得平整的阵列光纤组件端面,其表面粗糙度可低至 42. 6 nm,光纤凸起值可低至 0. 14 μm。
英文摘要:
      Objective To obtain the flat end face of optical fiber array by designing proper polishing process plan. Methods The effects of polishing process parameters on the surface roughness of the optical fiber array and fiber projection were studied using single factor experiments, and the surface morphology was examined by Scanning Electronic Microscope and Optical Profilometer. Results Flat end face of optical fiber array was obtained under the conditions of particle concentration of 2% , polishing slurry flow rate of 15 mL/ min, polishing pressure of 50 kPa, and rotation speed of 30 r/ min. Conclusion Using chemical mechanical polishing to process optical fiber array, in combination with designing proper polishing process parameters, a perfect end-face of optical fiber array with surface roughness of 42. 6 nm and fiber projection of 0. 14 μm was achieved.
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