严彪杰,张向东,白彬,杨飞龙.Ni /Ti 多层膜界面状态优化分析[J].表面技术,2014,43(5):47-50,86.
YAN Biao-jie,ZHANG Xiang-dong,BAI Bin,YANG Fei-long.Optimizing Analysis of Interface State of the Ni /Ti Multilayer Films[J].Surface Technology,2014,43(5):47-50,86 |
| Ni /Ti 多层膜界面状态优化分析 |
| Optimizing Analysis of Interface State of the Ni /Ti Multilayer Films |
| 投稿时间：2014-04-22 修订日期：2014-06-11 |
| DOI： |
| 中文关键词: 中子超镜 Ni /Ti 多 层膜 粗糙度 离 子抛光 反应溅射 |
| 英文关键词:neutron super-mirrors Ni /Ti multilayer films roughness ion polishing reactive sputtering |
| 基金项目: |
|
|
|
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 目 的 减小 Ni /Ti 多 层膜表面粗糙度, 提高 Ni /Ti 多 层膜对中 子束的反射率。 方法 采用 离 子束辅助沉积设备沉积 Ni /Ti 周 期性多 层膜, 通过不同 抛光时间 和不同 离 子能量轰击对多 层膜界面进行清洗抛光; 采用 反应溅射法, 在镀 Ti 层时使用 氢气和氩气混合气为工作气体, 将 H 原子掺入 Ti 层以改变晶粒结构而影响多 层膜界面状态。 结果 随着辅助离 子源功率的增加, Ni /Ti 多 层膜的表面粗糙度增加; 在合适的 离 子能量下, 随着抛光时间 的 不 断增加, Ni /Ti 多 层膜的 表面 粗糙度逐渐减小。 Ti 层中 掺 H 的Ni /Ti多 层膜比未掺 H 的多 层膜表面粗糙度小, 界面更加清晰。 结论 低能量的离 子轰击条件下, 适当 的抛光时间 能对多 层膜实现较好的抛光效果。 Ti 层中 掺入 H 原子, 抑制 了 Ni 原子与 Ti 原子的 扩散, 减小了 Ti 膜层晶粒大小, 从而抑制了 表面粗糙度的增加。 |
| 英文摘要: |
| Objective To reduce the interface roughness of the Ni /Ti multilayer film, and improve the neutron reflectivity of the multilayer. Methods A series of Ni /Ti periodic multilayers were fabricated by the ion beam assisted deposition device, and the Ni / Ti multilayers were rinsed and polished though bombarding by ion beam with different ion energy and polishing time. The Ni /Ti multilayers was deposited by the reactive sputtering, the argon gas mixed with hydrogen was used as the working gas when the Ti layers were deposited to embed the hydrogen atom into the Ti layers, which can change the grain structure and affect the interface state of Ni /Ti multilayers. Results With the increase of the assisted ion source忆s power, the surface roughness of the Ni /Ti multilayer films was increased. And under appropriate ion energy condition, with the bombardment time getting longer, the surface roughness of the Ni /Ti multilayers was reduced, the surface roughness of the Ni /Ti multilayers films became smaller and the interfaces got more distinct when the H atoms were embedded into the Ti layers. Conclusion The interface state of the multilayer films can get better when impacted by the lower energy ion beam with the suitable time of polishing. The hydrogen atom in the Ti crystal lattice can suppress the diffusion between the Ni and Ti layers, and reduce the grain size thus suppressing the increase in the interface roughness. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号