徐均琪,郭芳,苏俊宏,邹逢.激光薄膜的设计与制备[J].表面技术,2014,43(2):75-78,99.
XU Jun-qi,GUO Fang,SU Jun-hong,ZOU Feng.Design and Preparation of Thin Films for Laser System[J].Surface Technology,2014,43(2):75-78,99
激光薄膜的设计与制备
Design and Preparation of Thin Films for Laser System
投稿时间:2013-12-04  修订日期:2013-12-24
DOI:
中文关键词:  薄膜  激光损伤阈值  优化  退火
英文关键词:film  laser-induced damage threshold ( LIDT)  optimization  annealing
基金项目:国家国际科技合作专项资助(2013DFR70620) ;国家自然科学基金资助(61378050)
作者单位
徐均琪 西安工业大学 陕西省薄膜技术与光学检测重点实验室, 西安 710032 
郭芳 西安工业大学 陕西省薄膜技术与光学检测重点实验室, 西安 710032 
苏俊宏 西安工业大学 陕西省薄膜技术与光学检测重点实验室, 西安 710032 
邹逢 西安工业大学 陕西省薄膜技术与光学检测重点实验室, 西安 710032 
AuthorInstitution
XU Jun-qi Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi'an Technological University, Xi'an 710032, China 
GUO Fang Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi'an Technological University, Xi'an 710032, China 
SU Jun-hong Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi'an Technological University, Xi'an 710032, China 
ZOU Feng Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi'an Technological University, Xi'an 710032, China 
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中文摘要:
      目的 研究激光薄膜的膜系结构及提高激光损伤阈值的制备工艺。 方法 基于场强优化分布,设计 Si 基底上 3 ~ 5 滋m 增透、1064 nm 截止的激光薄膜,对镀后的薄膜进行激光辐照处理和真空退火处理,分析薄膜的相关性能。 结果 薄膜内部不同的场强分布会对其激光损伤特性产生不同的影响。 在满足光学性能的情况下,采用适当的膜系结构,使膜层 / 膜层界面处的电场强度降低,或者使最大电场强度存在于激光损伤阈值较高的材料中,可有效提高整个膜系的激光损伤阈值。 采用激光辐照处理和真空退火处理,也可以提高薄膜的激光损伤阈值。 结论 经过优化设计、激光辐照和真空退火处理,最终可使 Si基底上红外减反薄膜的激光损伤阈值提高到 6 . 2 J / cm2
英文摘要:
      Objective To study the laser film stacks and the methods for improving the film爷 s laser-induced damage threshold. Methods Based on the optimization distribution of electric field intensity, film stacks with high anti-reflection in the band of 3 ~ 5 滋m and cut-off in the wavelength of 1064 nm on silicon substrates were designed. All these films were deposited by thermal evaporation techniques, and then the as-deposited thin films underwent a treatment process of laser irradiation and vacuum annealing. Results The results indicated that the various distribution of electric field intensity caused different laser damage properties of thin films. The laser-induced damage threshold ( LIDT) could be improved by designing suitable film stacks to lower the electric field intensity in the interface between layers, or putting the electric field peak in layers with high laser damage ability. The LIDT could also be improved by laser irradiation and vacuum annealing. Conclusion The final laser-induced damage threshold was improved from 3 J / cm2to 6. 2 J / cm2by the process of design optimization, laser irradiation and vacuum annealing.
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