付文博,梁建华,王维笃,周晓松,杨本福,程贵均.薄膜理想台阶的制备方法研究[J].表面技术,2013,42(6):113-118.
FU Wen-bo,LIANG Jian-hua,WANG Wei-du,ZHOU Xiao-song,YANG Ben-fu,CHENG Gui-jun.Study on the Preparation Method for Ideal Steps in Thin Films[J].Surface Technology,2013,42(6):113-118 |
| 薄膜理想台阶的制备方法研究 |
| Study on the Preparation Method for Ideal Steps in Thin Films |
| 投稿时间：2013-06-11 修订日期：2013-07-19 |
| DOI： |
| 中文关键词: 薄膜 膜厚 边缘效应 理想台阶 粗糙度 |
| 英文关键词:thin films film thickness edge effect the ideal step roughness |
| 基金项目:中国工程物理研究院科技发展基金资助项目(2010A0301011) |
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| Author | Institution |
| FU Wen-bo | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
| LIANG Jian-hua | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
| WANG Wei-du | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
| ZHOU Xiao-song | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
| YANG Ben-fu | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
| CHENG Gui-jun | Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China |
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| 中文摘要: |
| 目的 研究台阶的形貌对台阶仪测试的影响,准确测试薄膜的厚度。 方法 分析制备台阶中存在的问题,针对这些问题设计了中轴线位置带掩膜条的掩膜板,并采用该新型掩膜板,在不同衬底上制备台阶,用台阶仪对薄膜的厚度进行测定。 结果 在薄膜中轴线附近做出的台阶,坡度陡峭,上下表面清晰。 Mo 衬底上制备出的薄膜厚度重复性较好;单晶硅衬底上制备的薄膜表面粗糙度较大;石英衬底上制备薄膜形成的台阶上下表面均较为平滑。 结论 使用新型掩膜板在石英衬底上制备出理想台阶,可较为准确地测试薄膜的厚度。 |
| 英文摘要: |
| Objective To study the impact of the morphology of steps on the level meter measurement, and to accurately test the thickness of the films. Methods The problems in the preparation of steps were analyzed, the meddle line strip mask was designed based on these problems, and the new mask was used to prepare steps on different substrates, and then the thickness of the films was measured by level meter. Results The steps near the meddle line of thin films had steep slope, and the upper and lower surfaces were clear. The thickness of the films prepared on the polished Mo substrate had good reproducibility; the films on single crystal silicon substrate had large surface roughness; the upper and lower surfaces of the steps of films prepared on quartz substrates were the smoothest . Conclusion The use of new mask can help to prepare the ideal steps on quartz substrates for relatively accurate test of the film thickness. |
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