龚鹏,范真,丁建宁,程广贵,袁宁一,凌智勇.氮化铜薄膜制备中氮气比例对其结构及微观力学性能的影响[J].表面技术,2013,42(5):15-18,31.
GONG Peng,FAN Zhen,DING Jian-ning,CHENG Guang-gui,YUAN Ning-yi,LING Zhi-yong.Effect of Nitrogen Partial Pressure on the Structure and Micro-mechanical Properties of Cu3N Films[J].Surface Technology,2013,42(5):15-18,31
氮化铜薄膜制备中氮气比例对其结构及微观力学性能的影响
Effect of Nitrogen Partial Pressure on the Structure and Micro-mechanical Properties of Cu3N Films
投稿时间:2013-04-25  修订日期:2013-05-17
DOI:
中文关键词:  氮化铜薄膜  射频磁控溅射  微结构  纳米力学
英文关键词:copper nitride thin film  r. f . magnetron sputtering  micro structure  nano-mechanical
基金项目:国家自然科学基金项目(51272033)
作者单位
龚鹏 江苏大学 微纳米研究中心, 镇江 212013 
范真 江苏大学 微纳米研究中心, 镇江 212013;江苏理工学院 机械工程学院,常州 213001 
丁建宁 江苏大学 微纳米研究中心, 镇江 212013;常州大学 低维材料微纳器件与系统中心, 常州 213164 
程广贵 江苏大学 微纳米研究中心, 镇江 212013 
袁宁一 常州大学 低维材料微纳器件与系统中心, 常州 213164 
凌智勇 江苏大学 微纳米研究中心, 镇江 212013 
AuthorInstitution
GONG Peng Micro and Nano Science and Technology Research Center, Jiangsu University, Zhenjiang 212013 , China 
FAN Zhen Micro and Nano Science and Technology Research Center, Jiangsu University, Zhenjiang 212013 , China;School of Mechanical Engineering, Jiangsu University of Technology, Changzhou 213001 , China 
DING Jian-ning Micro and Nano Science and Technology Research Center, Jiangsu University, Zhenjiang 212013 , China;Center of Low-dimensional Materials Micro-nano Devices and Systems,Changzhou University, Changzhou 213164 , China 
CHENG Guang-gui Micro and Nano Science and Technology Research Center, Jiangsu University, Zhenjiang 212013 , China 
YUAN Ning-yi Center of Low-dimensional Materials Micro-nano Devices and Systems,Changzhou University, Changzhou 213164 , China 
LING Zhi-yong Micro and Nano Science and Technology Research Center, Jiangsu University, Zhenjiang 212013 , China 
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中文摘要:
      采用射频磁控溅射方法在玻璃基底上制备氮化铜薄膜,研究了氮氩混合气体中的氮气比例对薄膜择优生长取向、表面晶粒尺寸和微观力学性能的影响。 结果表明:低氮气比例时,薄膜的纳米力学性能比较差;随着氮气比例的增加,氮化铜薄膜的择优生长晶面从( 111 ) 晶面转变为( 100 ) 晶面,晶粒尺寸变小, 显微硬度增加,弹性模量则是先增加,后减小。
英文摘要:
      Copper nitride thin films were prepared on silicon glass substrates by means of RF magnetron sputtering deposition, and then the effects of nitrogen partial pressure in a fixed-total N2-Ar mixture sputtering gas flow on the preferential crystalline orientation, the size of surface grain and micro-mechanical properties were investigated. It is showed that when the nitrogen partial pressure is low, the nano-mechanical property of the thin film is poor. As nitrogen partial pressure improves the preferential orientation transforms from plane (111 ) to plane (100 ) , the crystalline grain size shrinks and the elastic modulus first increases but then decreases.
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