张艳茹,杭凌侠,郭峰,宁晓阳.直流反应磁控溅射制备 a-C:H 薄膜及其表面粗糙度研究[J].表面技术,2013,42(2):92-94,121. ZHANG Yan-ru,HANG Ling-xia,GUO Feng,NING Xiao-yang.Study on Deposition of a-C:H Film by Reactive DC Magnetron Sputtering and Its Surface Roughness[J].Surface Technology,2013,42(2):92-94,121 |
直流反应磁控溅射制备 a-C:H 薄膜及其表面粗糙度研究 |
Study on Deposition of a-C:H Film by Reactive DC Magnetron Sputtering and Its Surface Roughness |
投稿时间:2012-11-15 修订日期:2012-12-29 |
DOI: |
中文关键词: 直流反应磁控溅射 含氢类金刚石薄膜 沉积速率 表面粗糙度 |
英文关键词:reactive DC magnetron sputtering DLC films with various hydrogen contents deposition rate surfaceroughness |
基金项目:陕西省教育厅科学研究计划项目(12JK0433) |
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Author | Institution |
ZHANG Yan-ru | Key Laboratory of Thin Film Technology and Optical Test of Shaanxi Province,Xi'an Technological University, Xi'an 710032 , China |
HANG Ling-xia | Key Laboratory of Thin Film Technology and Optical Test of Shaanxi Province,Xi'an Technological University, Xi'an 710032 , China |
GUO Feng | Key Laboratory of Thin Film Technology and Optical Test of Shaanxi Province,Xi'an Technological University, Xi'an 710032 , China |
NING Xiao-yang | Key Laboratory of Thin Film Technology and Optical Test of Shaanxi Province,Xi'an Technological University, Xi'an 710032 , China |
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中文摘要: |
为研究含氢类金刚石( a-C: H) 薄膜的制备及性能, 充入含—CH3 原子团的 CH4 气体, 在不同CH4/ Ar 流量比条件下于 N 型硅基底上沉积 a-C:H 薄膜,并借助椭偏仪、非接触式白光干涉仪及激光波面干涉仪对薄膜的沉积速率及表面粗糙度进行测定。 结果表明,含氢碳源气体的加入提高了类金刚石薄膜的沉积速率,改善了表面平整度。 |
英文摘要: |
The —CH3 atoms methane gas was filled to study the preparation and performance of the hydrogen-containing DLC( a-C:H) thin film. At different CH4 / Ar flow ratio condition, the a-C:H was deposited on the N type silicon substrate. By means of ellipsometer, the non-contact white light interferometer as well as the laser wave interferometer, the deposition rate and surface roughness were lucubrated. Experiment results show that the deposition rate of the diamond-like carbon thin film is enhanced by the addition of the hydrogen-containing carbon gas and the surface flatness is also improved. |
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