弥谦,王昆,刘哲.直流磁过滤电弧源沉积氧化铝薄膜的研究[J].表面技术,2013,42(1):78-80,100.
MI Qian,WANG Kun,LIU Zhe.Alumina Oxide Thin Film Prepared by DC Magnetic Filtered Arc Source Deposition Technology[J].Surface Technology,2013,42(1):78-80,100 |
| 直流磁过滤电弧源沉积氧化铝薄膜的研究 |
| Alumina Oxide Thin Film Prepared by DC Magnetic Filtered Arc Source Deposition Technology |
| 投稿时间：2012-09-07 修订日期：2012-10-08 |
| DOI： |
| 中文关键词: 电弧源 磁过滤 氧化铝薄膜 氧气分量 阴极靶电流 |
| 英文关键词:arc source magnetic filter alumina oxide films oxygen component cathode target current |
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| 中文摘要: |
| 采用直流磁过滤电弧源技术,在 K9 玻璃基底上制备氧化铝薄膜,研究了沉积时的氧气分量和阴极靶电流对薄膜折射率、沉积速率、消光系数和表面粗糙度的影响。 结果表明:薄膜折射率、沉积速率和消光系数均随着氧气分量的增加而降低,随着阴极靶电流的升高而增加;薄膜表面粗糙度则随氧气分量或阴极靶电流的增加,呈先减小、后增大的趋势。 分析认为,主要是因为随着氧气分量和阴极靶电流的变化,基底表面铝原子和氧气的比例发生了改变,进而影响到薄膜的相关性能。 |
| 英文摘要: |
| Alumina oxide thin film was fabricated on K9 glass by DC magnetic filtered arc source technology and the influence of the oxygen component and cathode target current on films' refractive index,deposition rate,extinction coefficient and surface roughness was researched. The results of experiment show that the films' refractive index,the deposition rate and the extinction coefficient decreases with the increase of the oxygen component,but increases with the rise of the cathode target current; The surface roughness are reduced initially,but increased after. And the main reason is that the proportion of the aluminum atomsand oxygen on the surface of substrate is changed by the change of the oxygen component and the cathode target current, related to the performance of the film. |
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