霍红英,邹敏,马光强,常会.本底真空度对磁控溅射法制备 AZO 薄膜的影响[J].表面技术,2013,42(1):75-77.
HUO Hong-ying,ZOU Min,MA Guang-qiang,CHANG Hui.Influence of the Base Pressure on AZO Film Deposited by Magnetron Sputter Method[J].Surface Technology,2013,42(1):75-77 |
| 本底真空度对磁控溅射法制备 AZO 薄膜的影响 |
| Influence of the Base Pressure on AZO Film Deposited by Magnetron Sputter Method |
| 投稿时间：2012-08-29 修订日期：2012-09-20 |
| DOI： |
| 中文关键词: 磁控溅射 AZO 薄膜 本底真空度 |
| 英文关键词:magnetron sputter AZO film base pressure |
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| 中文摘要: |
| 采用直流磁控溅射方法在平板玻璃基体表面沉积 AZO 薄膜,研究了本底真空度对薄膜厚度、方块电阻以及在 300 ~ 1100 nm 波长范围内透过率的影响。 结果表明:薄膜的方块电阻和透过率随本底真空度的提高而降低,厚度随本底真空度的提高而增加;本底真空度较低时,其变化对薄膜的厚度、方块电阻和透过率的影响较大,随着本底真空度的增加,影响程度逐渐降低。 |
| 英文摘要: |
| A AZO film was deposited on the top of flat glass with DC magnetron sputtering technology. The influence of base pressure on the film thickness,square resistance, transmissivity in 300 ~ 1100 nm wavelength was studied. The experimental results show that AZO film's square resistance and transmissivity have a decline trend, but the thickness become thinner with the increase of base pressure. When the base pressure is in low level, the square resistance, transmissivity and thickness of AZO film are influenced conspicuously by base pressure. These influences will decline if continue to increase the base pressure. |
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