万小波,邢丕峰,易泰民,杨蒙生,郑凤成,徐导进,王昆黍,楼建设,孔泽斌,祝伟明.工作气压对直流磁控溅射 Mo 薄膜的影响[J].表面技术,2013,42(1):71-74.
WAN Xiao-bo,XING Pi-feng,YI Tai-min,YANG Meng-sheng,ZHENG Feng-cheng,XU Dao-jin,WANG Kun-shu,LOU Jian-she,KONG Ze-bin,ZHU Wei-ming.Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering[J].Surface Technology,2013,42(1):71-74
工作气压对直流磁控溅射 Mo 薄膜的影响
Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering
投稿时间:2012-08-27  修订日期:2012-10-22
DOI:
中文关键词:  Mo 薄膜  直流磁控溅射  工作气压  晶粒尺寸  微观应力
英文关键词:molybdenum films  direct current magnetron sputtering  working pressure  grain size  microstrain
基金项目:
作者单位
万小波 中国工程物理研究院 激光聚变研究中心, 绵阳 621900 
邢丕峰 中国工程物理研究院 激光聚变研究中心, 绵阳 621900 
易泰民 中国工程物理研究院 激光聚变研究中心, 绵阳 621900 
杨蒙生 中国工程物理研究院 激光聚变研究中心, 绵阳 621900 
郑凤成 中国工程物理研究院 激光聚变研究中心, 绵阳 621900 
徐导进 上海精密计量测试研究所, 上海 201109 
王昆黍 上海精密计量测试研究所, 上海 201109 
楼建设 上海精密计量测试研究所, 上海 201109 
孔泽斌 上海精密计量测试研究所, 上海 201109 
祝伟明 上海精密计量测试研究所, 上海 201109 
AuthorInstitution
WAN Xiao-bo Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900 , China 
XING Pi-feng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900 , China 
YI Tai-min Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900 , China 
YANG Meng-sheng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900 , China 
ZHENG Feng-cheng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900 , China 
XU Dao-jin Shanghai Research Institute of Precision Measuring and Testing, Shanghai 201109 , China 
WANG Kun-shu Shanghai Research Institute of Precision Measuring and Testing, Shanghai 201109 , China 
LOU Jian-she Shanghai Research Institute of Precision Measuring and Testing, Shanghai 201109 , China 
KONG Ze-bin Shanghai Research Institute of Precision Measuring and Testing, Shanghai 201109 , China 
ZHU Wei-ming Shanghai Research Institute of Precision Measuring and Testing, Shanghai 201109 , China 
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中文摘要:
      利用直流磁控溅射技术在单晶 Si( 110 ) 基底上制备 Mo 薄膜,分析了工作气压对沉积速率、表面质量及微观结构的影响。 结果表明:薄膜的沉积速率随压强的增大而增加;低气压下沉积的 Mo 薄膜表面质量较好且结构致密,高气压下沉积的 Mo 薄膜表面质量较差且结构疏松;在工作气压为 0 . 8 Pa 时,制备的 Mo 薄膜晶粒尺寸与微观应力值最小。
英文摘要:
      Mo films were successfully deposited by DC magnetron sputtering on Si substrates. The influences of deposition rate, surface tomograph and microstructure were analyzed. The results show that deposition rate increases with pressure.The film sputtered at low pressure has good crystallization and exhibites dense structure. Under high pressure conditions, the film exhibites bad crystallization and loose structure. At the pressure of 0 . 8 Pa, the film has lowest value of crysize and microstrain.
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