韩丽.直流磁控溅射法在玻璃上沉积金属镍膜的研究[J].表面技术,2012,(6):65-67.
HAN Li.Properties of Nickel Coating Deposited on Glass by DC Magnetron Sputtering[J].Surface Technology,2012,(6):65-67 |
| 直流磁控溅射法在玻璃上沉积金属镍膜的研究 |
| Properties of Nickel Coating Deposited on Glass by DC Magnetron Sputtering |
| 投稿时间：2012-08-29 修订日期：2012-12-20 |
| DOI： |
| 中文关键词: 磁控溅射 半透镍膜 液晶显示 真空镀膜 |
| 英文关键词:magnetron sputtering semitransparent Ni coating LCD display vacuum coating |
| 基金项目:河北省建设厅资助项目(2009-129) |
|
|
|
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 采用直流磁控溅射法,在玻璃基板上制备了用于显示器视窗保护玻璃的半透明镍膜,测定了不同溅射条件下所得镍膜的表面粗糙度、透过率及厚度,讨论了溅射气压、溅射功率、行车速度等对薄膜性能的影响。结果表明,薄膜的表面粗糙度随溅射功率的增加而增大,控制溅射气压、溅射功率和行车速度为一定值,可以得到透过率为50%的半透镍膜。 |
| 英文摘要: |
| Semitransparent nickel coating used for cover lens of display was deposited on glass substrate by DC magnetron sputtering, the variation of surface roughness, transmittance and thickness of the nickel coating obtained with different sputtering process was tested. The influence of sputtering gas pressure, sputtering power and carrier moving speed on coating properties were discussed. The result shows that the surface roughness of the coating increases along with the increase of sputtering power, the nickel coating with 50% transmittance can be obtained with appropriate sputtering gas pressure, sputtering power and carrier moving speed. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
渝公网安备 50010702501715号