祝闻,冉春华,金义栋,聂朝胤,王振林.掺Ti量对类金刚石薄膜机械性能的影响[J].表面技术,2012,(5):7-10.
ZHU Wen,RAN Chun-hua,JIN Yi-dong,NIE Chao-yin,WANG Zhen-lin.The Effect of Ti Content on Mechanical Properties of DLC Films[J].Surface Technology,2012,(5):7-10
掺Ti量对类金刚石薄膜机械性能的影响
The Effect of Ti Content on Mechanical Properties of DLC Films
投稿时间:2012-06-15  修订日期:2012-10-20
DOI:
中文关键词:  非平衡磁控溅射  掺Ti类金刚石薄膜  结合强度  摩擦磨损性能
英文关键词:unbalanced magnetron sputtering  Ti-DLC  cohesion  tribological and wear properties
基金项目:重庆市科技攻关项目(CSTC,2008AC4017)
作者单位
祝闻 西南大学材料科学与工程学院,重庆400715 
冉春华 西南大学材料科学与工程学院,重庆400715 
金义栋 西南大学材料科学与工程学院,重庆400715 
聂朝胤 西南大学材料科学与工程学院,重庆400715 
王振林 重庆理工大学材料科学与工程学院,重庆400050 
AuthorInstitution
ZHU Wen School of Materials Science and Engineering, Southwest University, Chongqing 400715, China 
RAN Chun-hua School of Materials Science and Engineering, Southwest University, Chongqing 400715, China 
JIN Yi-dong School of Materials Science and Engineering, Southwest University, Chongqing 400715, China 
NIE Chao-yin School of Materials Science and Engineering, Southwest University, Chongqing 400715, China 
WANG Zhen-lin School of Materials Science and Engineering, Southwest University, Chongqing 400715, China 
摘要点击次数:
全文下载次数:
中文摘要:
      采用非平衡磁控溅射技术,通过改变Ti靶溅射电流,在不锈钢衬底表面沉积了不同掺Ti量的类金刚石薄膜(Ti-DLC),研究了掺Ti量对薄膜的显微硬度、弹性模量、膜/基结合强度、断裂韧性及摩擦磨损行为的影响。结果表明:DLC薄膜掺杂Ti后,硬度明显提高,且随着Ti靶溅射电流的增大,薄膜硬度先增加、后降低,Ti靶溅射电流为1.5A 时,薄膜硬度最高;掺杂适量的Ti,可以明显改善DLC薄膜的膜/基结合强度和断裂韧性,并能明显降低DLC薄膜的摩擦系数。
英文摘要:
      Using unbalanced magnetron sputtering technique, diamond-like carbon films with different titanium contents(Ti-DLC)were deposited on stainless steel substrates by changing Ti target supttering current. Investigated the influences of Ti content on microhardness, elastic modulus, film-substrate cohesion, fracture toughness, friction and wear behavior of films. Results showed that the hardness of the Ti-DLC films increases obviously compared with the pure DLC films. In the meantime, the hardness of the Ti-DLC films increases first and then decreases with the increase of the Titarget sputtering current and reaches the highest when Ti target sputtering current is increased to 1.5A. Film-substrate cohesion and fracture toughness of the films are improved by depositing some Ti. The friction coefficient of DLC films decreases significantly with the deposition of Ti.
查看全文  查看/发表评论  下载PDF阅读器
关闭

关于我们 | 联系我们 | 投诉建议 | 隐私保护 | 用户协议

您是第21802219位访问者    渝ICP备15012534号-3

版权所有:《表面技术》编辑部 2014 surface-techj.com, All Rights Reserved

邮编:400039 电话:023-68792193传真:023-68792396 Email: bmjs@surface-techj.com

渝公网安备 50010702501715号