蔡航伟,高原,马志康,王成磊,袁琳,张维,李冰.钨钼钇等离子共渗工艺及渗层组织的研究[J].表面技术,2012,(2):16-19.
CAI Hang-wei,GAOY uan,MA Zhi-kang,WANG Cheng-lei,YUAN Lin,ZHANG Wei,LI Bing.Research on W-Mo-Y Plasma Surface Alloying Process and Microstructure of Alloying Layer[J].Surface Technology,2012,(2):16-19
钨钼钇等离子共渗工艺及渗层组织的研究
Research on W-Mo-Y Plasma Surface Alloying Process and Microstructure of Alloying Layer
投稿时间:2011-01-26  修订日期:2012-04-20
DOI:
中文关键词:  辉光等离子  钨钼钇共渗  渗层厚度
英文关键词:glow plasma  W-Mo-Y surface alloying  thickness of alloying layer
基金项目:国家自然科学基金项目(50764002);信息材料广西重点实验室主任研究课题(桂科能0710908-06-Z);广西区自然科学基金重点项目(2010GXNSFD013008)
作者单位
蔡航伟 桂林电子科技大学材料科学与工程学院,桂林541004 
高原 桂林电子科技大学材料科学与工程学院,桂林541004 
马志康 桂林电子科技大学材料科学与工程学院,桂林541004 
王成磊 桂林电子科技大学材料科学与工程学院,桂林541004 
袁琳 桂林电子科技大学材料科学与工程学院,桂林541004 
张维 桂林电子科技大学材料科学与工程学院,桂林541004 
李冰 桂林电子科技大学材料科学与工程学院,桂林541004 
AuthorInstitution
CAI Hang-wei School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
GAOY uan School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
MA Zhi-kang School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
WANG Cheng-lei School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
YUAN Lin School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
ZHANG Wei School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
LI Bing School of Materials Science and Technology, Guilin University of Electronic Technology, Guilin 541004, China 
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中文摘要:
      利用辉光等离子渗金属技术,在低碳钢Q235表面进行钨钼钇共渗,研究了极间距、保温温度、气压、保温时间对渗层厚度的影响,进而确定最优工艺参数,并对渗层的金相组织、合金元素分布及物相组成进行分析。结果表明:极间距25mm、保温温度1000℃、工作气压30Pa、保温时间3h为最优参数,所得渗层的厚度可达37μm;渗层组织为柱状晶,渗层与基体有一明显分界线;钨、钼在渗层中呈梯度分布,钇在渗层中呈不均匀分布并在晶界处发生偏聚。
英文摘要:
      Low carbon steel Q235 was firstly conducted by W-Mo-Y double glow plasma surface alloying process.Then the optimal process parameters were confirmed by means of researching the effects of electrode distance, working pressure, holding time, and holding temperature on the thickness of alloying layer. And Optical morphologies, alloying elements distribution and phase composition were analyzed. The results show as follows: the optimal process parameters of W-Mo-Y surface alloying process are as follows: interelectrode distance 25 mm, working pressure 30 Pa, holding time 3 h, holding temperature 1000 ℃. The thickness of alloying layer can reach 37 μm; The microstructure of alloying layer is columnar crystal, and there is anobvious boundary between alloying layer and the matrix. And W and Mo in alloying layer are in gradient distribution. Y is not evenly distributed, and segregate at grain boundaries.
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