何佳恒,陈琪萍,党宇峰,钟文彬,王静.电沉积法制备238U靶件的研究[J].表面技术,2010,39(6):80-83.
HE Jia-heng,CHEN Qi-ping,DANG Yu-feng,ZHONG Wen-bin,WANG Jing.Preparation of 238U Targets by Electro-deposition Method[J].Surface Technology,2010,39(6):80-83
电沉积法制备238U靶件的研究
Preparation of 238U Targets by Electro-deposition Method
投稿时间:2010-03-26  修订日期:2010-12-10
DOI:
中文关键词:  电沉积    
英文关键词:electro-deposition  Uranium  target
基金项目:中国工程物理研究院重点预研基金资助项目(4210507)
作者单位
何佳恒 中国工程物理研究院核物理与化学研究所,绵阳621900 
陈琪萍 中国工程物理研究院核物理与化学研究所,绵阳621900 
党宇峰 中国工程物理研究院核物理与化学研究所,绵阳621900 
钟文彬 中国工程物理研究院核物理与化学研究所,绵阳621900 
王静 中国工程物理研究院核物理与化学研究所,绵阳621900 
AuthorInstitution
HE Jia-heng Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, 621900, China 
CHEN Qi-ping Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, 621900, China 
DANG Yu-feng Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, 621900, China 
ZHONG Wen-bin Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, 621900, China 
WANG Jing Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, 621900, China 
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中文摘要:
      为了提高单个靶件的铀装载量,简化制备工艺,将目前广泛用于制备α核素靶的电沉积方法用于铀靶的制备。研究了在水溶液体系中电沉积制备铀靶的方法,以0.15 mol/ L草酸铵为电沉积液,研究了不锈钢基层处理工艺、电流密度、酸度、温度、镀液中铀离子浓度等对电沉积层质量的影响,确定了电沉积法制备铀靶的工艺参数,运用扫描电子显微镜、X射线能谱和红外光谱对电沉积层的表面形貌、微区成分和结构组成进行分析和表征。控制镀液中UO2(NO3)2的量,调节镀液pH至2~ 3,电流密度60 mA/cm2,通入60℃恒温水,保持(NH4)2C2O4的质量浓度在4 ~ 6 mg/mL2,即可获得6 mg/cm2的电沉积层,分光光度法测其电沉积效率>98%,厚度约6 mg/cm2。
英文摘要:
      In order to increase the amount of uranium target, simplify preparation process, electrodeposition method that widely used for preparation ofα nuclides target was used for preparation of uranium target. Preparation method of electro-deposition uranium targets was researched. Taking 0.15mol/ L ammonium oxalate as electrodeposion solution, the effect of base teatment process of stainless steel, current density, acidity, temperature, uranium ion concentration in plating solution on quality of electrodeposited layer was studied. The process parameters of preparation of uranium targets by electrodeposition were defined. The surface morphology,micro-zone component and structure of electrodeposited layer were analyzed and charactertized by infrared-ray spectrum, scanning electron microscope, and X-ray spectrum. The thickness of the uranium layers can reach 6 mg/cm2 by controlling the content of UO2(NO3)2in plaitng solution, at 60 mA/cm2, pH at 2~ 3, temperature at 60℃ , and(NH4)2C2O4quality concentration at 4~ 6 mg/mL. The spectrophotometry showed the electro-deposition layer was thin and adherent films with a yield near 98%.
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