王院生,熊计,王均.工业纯钛热浸镀铝及其抗高温氧化性能的研究[J].表面技术,2010,39(6):4-7,12.
WANG Yuan-sheng,XIONG Ji,WANG Jun.Commercial-purity Titanium Hot-dip Aluminium and Its High Temperature Oxidation Resistance[J].Surface Technology,2010,39(6):4-7,12
工业纯钛热浸镀铝及其抗高温氧化性能的研究
Commercial-purity Titanium Hot-dip Aluminium and Its High Temperature Oxidation Resistance
投稿时间:2010-08-15  修订日期:2010-12-10
DOI:
中文关键词:  热浸镀铝  工业纯钛TA2  循环氧化  抗高温氧化性能
英文关键词:hot-dip aluminum  commercial-purity titanium TA2  cyclic oxidation  oxidation resistance at high temperature
基金项目:四川省2009年第三批支撑计划项目(2009GZ0101);博士点新教师基金(200806101051)
作者单位
王院生 四川大学制造科学与工程学院,成都610065 
熊计 四川大学制造科学与工程学院,成都610065 
王均 四川大学制造科学与工程学院,成都610065 
AuthorInstitution
WANG Yuan-sheng School of Manufacturing Science and Engineering, Sichuan University, Chengdu 610065, China 
XIONG Ji School of Manufacturing Science and Engineering, Sichuan University, Chengdu 610065, China 
WANG Jun School of Manufacturing Science and Engineering, Sichuan University, Chengdu 610065, China 
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中文摘要:
      通过XRD,SEM,EDS和高温循环氧化实验,研究了工业纯钛TA2在750℃热浸镀铝并扩散退火(950℃ × 6 h)后,所得热浸镀铝层在高温氧化前后的微观组织结构,分析了试样的抗高温氧化性能,并探讨了抗高温氧化性能得到提高的原因。结果表明:热浸镀铝层分为中间层与外层,中间层主要相是Ti3Al,外层又分为内扩散层和外扩散层,内扩散层形成了一层Al2O3氧化膜层,外扩散层主要相是TiAl3和Al2O3;TA2经热浸镀铝后,其高温抗氧化性能明显得到提高,主要原因是在热浸镀铝表层和内扩散层都形成了致密的Al2O3氧化膜。
英文摘要:
      The microstructure and oxidation resistance at high temperature of commercial-purity titanium TA2 were analyzed by means of EDS,SEM,XRD and the cyclic oxidation test,TA2 was hot-dip aluminizing at 750℃ and then annealing at 950℃ for 6 h. The reason of TA2 hot dip aluminum has good oxidation resistance at high temperature was also discussed. The results show that TA2 hot dip aluminum layer divides into two layers, the intermediate layer and the outer layer, the intermediate layer major phase is Ti3Al, the outer layer can be further divided into inner diffusion layer and outer diffusion layer, the inner diffusion layer main is a compact Al2O3oxide film, and the outer diffusion layer is TiAl3and Al2O3.Moreover,after hot dipping aluminum, the oxidation resistance at high temperature of TA2 was im- proved clearly. The real reason why TA2 has pretty good oxidation resistance at high temperature is the formed Al2O3 oxide film at surface layer and inner diffusion layer.
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