傅玉婷,巴俊洲,蒋亚雄,颜飞雪.研究蚀刻液稳定性的一种方法[J].表面技术,2010,39(1):91-92,96.
FU Yu-ting,BA Jun-zhou,JIANG Ya-xiong,YAN Fei-xue.A Method of Studying the Stability of Etching Solution[J].Surface Technology,2010,39(1):91-92,96 |
| 研究蚀刻液稳定性的一种方法 |
| A Method of Studying the Stability of Etching Solution |
| 投稿时间：2009-08-21 修订日期：2010-02-10 |
| DOI： |
| 中文关键词: 化学蚀刻 蚀刻液 稳定性 |
| 英文关键词:Chemic etching Etching solution Stability |
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| 中文摘要: |
| 为了得到更好的蚀刻效果,有必要研究蚀刻液的稳定性,因而研究方法显得尤为重要。研究了3组各成分含量不同的蚀刻液的稳定性,通过原子发射光谱法测得蚀刻液中Ni2+浓度,并间接计算出腐蚀量,对比考察了根据蚀刻速率-腐蚀量的关系和蚀刻速率-时间的关系研究蚀刻液稳定性这2种方法。实验结果证明:根据蚀刻速率-腐蚀量的关系研究蚀刻液的稳定性具有可行性,且更具优越性;同时,3种蚀刻液中,1B42稳定性最好,且该蚀刻液的最大金属腐蚀量为3 g/ L。 |
| 英文摘要: |
| In order to improve the effect of etching, it needed to study the stability of etching solution, and its method of studying was more important. Obtained the concentration of Ni2+ by ICP-AES, then obtained the weight of etched metal, studied the stability of three types of solution with different concentration, found the relations between etching rate and etched weight, as well as etching rate and etching time, then compared the both of them. It shows that the relations between etching rate and etched weight had superiority and is viable forevaluating the stability ofetching solution. Meanwhile, the stability of 1B42 is the best, and the solution's maximum of etched metal is more than 3 g/ L. |
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