杨琼,王传彬,章嵩,张东明,沈强,张联盟.沉积温度和退火处理对BCN薄膜结构的影响[J].表面技术,2010,39(1):63-66.
YANG Qiong,WANG Chuan-bin,ZHANG Song,ZHANG Dong-ming,SHEN Qiang,ZHANG Lian-meng.Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films[J].Surface Technology,2010,39(1):63-66
沉积温度和退火处理对BCN薄膜结构的影响
Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films
投稿时间:2009-09-18  修订日期:2010-02-10
DOI:
中文关键词:  BCN薄膜  沉积温度  退火  脉冲激光沉积
英文关键词:BCN thin films  Deposition temperature  Annealing  Pulsed laser deposition
基金项目:国家自然科学基金资助项目(50772082)
作者单位
杨琼 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
王传彬 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
章嵩 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
张东明 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
沈强 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
张联盟 武汉理工大学材料复合新技术国家重点实验室,武汉430070 
AuthorInstitution
YANG Qiong State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
WANG Chuan-bin State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
ZHANG Song State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
ZHANG Dong-ming State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
SHEN Qiang State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
ZHANG Lian-meng State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan 430070, China 
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中文摘要:
      采用脉冲激光沉积技术,在Si(100)基片上制备了BCN薄膜,研究了沉积温度和退火处理对BCN薄膜组分和结构的影响。利用傅里叶变换红外光谱(FTIR)和X射线光电子能谱(XPS)对制备的BCN薄膜进行了表征。结果表明:沉积温度升高时,BCN薄膜的组分无明显改变。所制备的BCN薄膜包含B— N,C— B和C— N化学键,是由杂化的B— C— N键构成的化合物。真空退火温度为700℃时,BCN薄膜结构稳定;大气退火温度达到600℃时,BCN薄膜表面发生氧化分解,同时有C≡ N键形成,表明C≡ N键具有较好的高温热稳定性。
英文摘要:
      BCN thin films were deposited on Si(100)substrates by pulsed laser deposition. The effects of deposition temperature and annealing on the film composition and structure were investigated.Fourier-transform infrared(FT-IR)spectroscopy and X-ray photoelectron spectroscopy(XPS)were used to characterize the BCN thin films. The results show that deposition temperatures have little influence on film composition. FTIR and XPS analyses indicated the as-deposited BCN films contained B— C, N— C and B— N chemical bonds with B— C— N atomic hybridization.BCN thin films which annealed in vacuum at 700℃ were stable.When annealed in air, the samples were oxidated. Meanwhile, the formation of C≡ N bond indicated that it has better thermal stability.
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