徐以兵,何德良,周舟,钟建芳.表面活性剂对铝合金表面电化学沉积硅烷膜层的影响[J].表面技术,2008,37(3):1-3,57.
XU Yi-bing,HE De-liang,ZHOU Zhou,ZHONG Jian-fang.Effects of Surfactant on Electrochemical Deposition of Silane Films on Aluminum Alloy[J].Surface Technology,2008,37(3):1-3,57 |
| 表面活性剂对铝合金表面电化学沉积硅烷膜层的影响 |
| Effects of Surfactant on Electrochemical Deposition of Silane Films on Aluminum Alloy |
| 投稿时间：2008-03-29 修订日期：2008-06-10 |
| DOI： |
| 中文关键词: 表面活性剂 铝合金 最佳沉积电位 硅烷膜 电化学沉积 |
| 英文关键词:Surfactant Aluminum Critical cathodic potential Silane film Electrochemical deposition |
| 基金项目:长沙市科技计划项目( K061018 -12) |
|
|
| Author | Institution |
| XU Yi-bing | State Key Laboratory of Chemo/Biosensing and Chemometrics, Hunan University, Changsha 410082, China |
| HE De-liang | State Key Laboratory of Chemo/Biosensing and Chemometrics, Hunan University, Changsha 410082, China |
| ZHOU Zhou | State Key Laboratory of Chemo/Biosensing and Chemometrics, Hunan University, Changsha 410082, China |
| ZHONG Jian-fang | State Key Laboratory of Chemo/Biosensing and Chemometrics, Hunan University, Changsha 410082, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 采用交流阻抗技术研究了表面活性剂对不同条件下双．1，2-[3（三乙氧基）硅丙基]四硫化物硅烷在铝合金表面阴极电化学辅助沉积成膜的影响。研究表明：在硅烷溶液中加入表面活性剂进行改性，可降低硅烷在铝合金表面电化学沉积的阴极沉积电位，抑制硅烷沉积过程中的析H：作用，改善电极界面区域硅烷成膜环境。试验证明：硅烷溶液中表面活性剂的最佳改性浓度为0. 03%，在此浓度下，铝合金表面硅烷阴极电沉积的最佳沉积电位为-1.6 V。 |
| 英文摘要: |
| The effect of surfactant on deposition of Bis-1,2-[ triethoxysilylpropyl] tetrasulfide ( BTSPS) silane films on aluminum alloy at different conditions was mvestigated by the electrochemical impedance spectroscopy ( EIS). The results show that the decreasing of electrodeposition potential, the hydrogen evolution and the improvement of interface region of electrode could be reached while the surfactant is added into the silane solution. It can be found that the optimum concentration of surfactant is 0.030/o , and a critical cathodic potential for silane deposition is -1. 6V under experimental conditions. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号